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Adnane, Bouchaib
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Adnane, B. (2010). Optical characterization of Silicon-based self-assembled nanostructures. (Doctoral dissertation). Linköping: Linköping University Electronic Press
Öppna denna publikation i ny flik eller fönster >>Optical characterization of Silicon-based self-assembled nanostructures
2010 (Engelska)Doktorsavhandling, sammanläggning (Övrigt vetenskapligt)
Abstract [en]

This PhD thesis summarizes the work carried on the optical characterizations of some Si-based self-assembled nanostructures, particularly SiGe/Si quantum dots (QDs) and nanocrystalline (nc)-Si embedded in mesoporous silica (MS) using photoconductivity (PC), photoluminescence (PL), and photoluminescence excitation (PLE) measurements.

The spectroscopic studies of SiGe/Si QDs grown on Si by molecular beam epitaxy revealed for the first time well-resolved PLE resonances. When correlated with numerical analysis, these resonances were directly related to the co-existence of spatially direct (inside the SiGe dot) and indirect (across the Si/Ge interface) recombination processes involving different dot populations selected by the monitored detection energy for PLE acquisition. The characteristics of these two transitions were further studied in detail by PLE (in some case implemented together with selective PL) on various samples, which contained either only one Ge dot layer or multiple Gedot/Si stacks, grown at substrate temperatures ranging from 430 to 580 °C; especially the temperature- and excitation power-dependence of the excitation properties. The results illustrated that the electronic structure of SiGe dots are influenced by size, Ge composition, as well as strain connected, and sometimes a mixed effect.

Another attempt of the project was the fabrication of lateral transport mid-infrared photodetectors based on multiple Ge-dot/Si stacked structures. A broadband photoresponsivity of the processed multi-finger detectors was estimated to be about 90 mA/W over 3-15 μm range at 20 K, and the peaked photoresponse was measured at ~10 μm. The origin of the measured photocurrent, as elucidated by photoluminescence and photoluminescence excitation spectroscopies, was related to intersubband absorption of normal incidence infrared radiation corresponding to energies between the ground states of the heavy hole and the light hole in the valence band of the SiGe/Si QDs, and subsequent charge transfer to the Ge 2D wetting layer acting as a conduction channel. The absence of photocurrent in the energy range expected for a transition from the ground state to the first excited state of the heavy hole indicated that the holes in the SiGe dots behave essentially as 2D in character rather than a truly 3D confinement, where the transitions between heavy holes states are not allowed for TE polarized radiation (normal incidence).

Finally, Si(or Ge) nanocrystals embedded in mesoporous silica samples prepared by spincoating and atomic layer chemical vapor deposition were optically investigated by means of PL with various excitation powers, together with several attempts using different post rapid thermal annealing processes. The shape and energy position of the PL spectra of the nc-Si embedded in MS samples and a reference MS template without nc incorporation were rather similar, but the luminescence was much more intense for those embedded with nanocrystals. This implies that the emission mechanism for MS samples with or without nc-Si could be the same, i.e., the light emission was governed by the surface properties of silica. The semiconductor nanocrystals played a role by sensitizing the luminescence emission through generating more photo-excited carriers. These carriers were then trapped in the defect state e.g. the interfacial oxygen defect sites and subsequently recombine to increase the PL intensity.

Ort, förlag, år, upplaga, sidor
Linköping: Linköping University Electronic Press, 2010. s. 54
Serie
Linköping Studies in Science and Technology. Dissertations, ISSN 0345-7524 ; 1296
Nationell ämneskategori
Naturvetenskap
Identifikatorer
urn:nbn:se:liu:diva-53206 (URN)978-91-7393-358-2 (ISBN)
Disputation
2010-06-17, Planck, Fysikhuset, Campus Valla, Linköpings universitet, Linköping, 10:15 (Engelska)
Opponent
Handledare
Tillgänglig från: 2010-01-19 Skapad: 2010-01-19 Senast uppdaterad: 2011-02-04Bibliografiskt granskad
Adnane, B., Karlsson, F., Hansson, G., Holtz, P.-O. & Ni, W.-X. (2010). Spatially direct and indirect transitions of self-assembled SiGe/Si quantum dots studied by photoluminescence excitation spectroscopy. Applied Physics Letters, 96(18), 181107
Öppna denna publikation i ny flik eller fönster >>Spatially direct and indirect transitions of self-assembled SiGe/Si quantum dots studied by photoluminescence excitation spectroscopy
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2010 (Engelska)Ingår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 96, nr 18, s. 181107-Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

Well-resolved photoluminescence excitation (PLE) spectra are reported for selfassembled SiGe dots grown on Si(100) by molecular beam epitaxy. The observation of two excitation resonance peaks is attributed to two different excitation/de-excitation routes of interband optical transitions connected to the spatially direct and indirect recombination processes. It is concluded that two dot populations are addressed by each monitored luminescence energy for the PLE acquisition.

Nyckelord
Ge-Si alloys, luminescence, molecular beam epitaxial growth, self-assembly, semiconductor quantum dots
Nationell ämneskategori
Naturvetenskap
Identifikatorer
urn:nbn:se:liu:diva-53204 (URN)10.1063/1.3424789 (DOI)000277422000007 ()
Anmärkning
Original Publication: Bouchaib Adnane, Fredrik Karlsson, Göran Hansson, Per-Olof Holtz and Wei-Xin Ni, Spatially direct and indirect transitions of self-assembled SiGe/Si quantum dots studied by photoluminescence excitation spectroscopy, 2010, Applied Physics Letters, (96), 18, 181107. http://dx.doi.org/10.1063/1.3424789 Copyright: American Institute of Physics http://www.aip.org/ Tillgänglig från: 2010-01-19 Skapad: 2010-01-19 Senast uppdaterad: 2017-12-12
Adnane, B., Karlsson, F., Zhao, M., Hansson, G., Holtz, P.-O. & Ni, W.-X. (2009). Origin of photoresponse at 8-14 μm in stacks of self-assembled SiGe/Si quantum dots. Physical Review B. Condensed Matter and Materials Physics
Öppna denna publikation i ny flik eller fönster >>Origin of photoresponse at 8-14 μm in stacks of self-assembled SiGe/Si quantum dots
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2009 (Engelska)Ingår i: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235XArtikel i tidskrift (Övrigt vetenskapligt) Submitted
Abstract [en]

A normal incidence photodetector operating at 8-14 μm is demonstrated using p-type δ-doped SiGe dot multilayer structures grown by molecular beam epitaxy on Si(001) substrates. Based on the experimental results of photoluminescence and photoluminescence excitation spectroscopies together with numerical analysis, the origin of the measured photocurrent was attributed to intersubband optical transitions between the heavy hole and light hole states of the valence band of the self-assembled SiGe dots and subsequent lateral transport of photo-excited carriers in the conduction channels formed by Ge wetting layers.

Nationell ämneskategori
Naturvetenskap
Identifikatorer
urn:nbn:se:liu:diva-53203 (URN)
Tillgänglig från: 2010-01-19 Skapad: 2010-01-19 Senast uppdaterad: 2017-12-12
Adnane, B., Karlsson, F., Hansson, G., Holtz, P.-O. & Ni, W.-X. (2009). Photoluminescence excitation spectroscopy of self-assembled SiGe/Si quantum dots.
Öppna denna publikation i ny flik eller fönster >>Photoluminescence excitation spectroscopy of self-assembled SiGe/Si quantum dots
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2009 (Engelska)Manuskript (preprint) (Övrigt vetenskapligt)
Abstract [en]

Photoluminescence excitation (PLE) experiments are reported for various self-assembled SiGe/Si dot samples grown on Si(001) by molecular beam epitaxy at substrate temperatures ranging from 430 to 580 C. Two excitation peaks were observed, and the characteristics of the involved optical transitions were studied in detail by PLE (in one case implemented together with selective photoluminescence, SPL) on different samples containing either only one SiGe dot layer or multiple SiGe-dot/Si stacks. The temperature- and power-dependence of the excitation properties together with the results of six-band k.p calculations support the assignment of the observed PLE peaks to spatially direct and indirect transitions collected from two different SiGe dot populations.

Nationell ämneskategori
Naturvetenskap
Identifikatorer
urn:nbn:se:liu:diva-53205 (URN)
Tillgänglig från: 2010-01-19 Skapad: 2010-01-19 Senast uppdaterad: 2015-01-23
Adnane, B., Lai, Y.-F., Shieh, J.-M., Holtz, P.-O. & Ni, W.-X. (2009). Photoluminescence study of nanocrystalline-Si(Ge) embedded in mesoporous silica. Solid-State Electronics, 53(8), 862-864
Öppna denna publikation i ny flik eller fönster >>Photoluminescence study of nanocrystalline-Si(Ge) embedded in mesoporous silica
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2009 (Engelska)Ingår i: Solid-State Electronics, ISSN 0038-1101, E-ISSN 1879-2405, Vol. 53, nr 8, s. 862-864Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

Photoluminescence (PL) properties of mesoporous silica (MS) samples incorporated with Si or Ge nanocrystals (nc) have been investigated with various excitation powers and post-RTA processes. The analysis of experimental results revealed a superlinear intensity dependence (m = 1.7) in the MS reference sample without nanocrystals, while a sublinear behavior (m = 0.8) is observed for the nc-Si in MS. It thus suggests the same recombination responsible for the luminescence at similar to 2.75 eV for both samples, but different kinetic limitations for the carrier transfer processes. Si nanocrystals play in this case an important role in generating more photo-excited carriers, enhancing the PL intensity.

Nyckelord
Mesoporous silica, Nanocrystals, Photoluminescence, Power dependence, Thermal annealing
Nationell ämneskategori
Naturvetenskap
Identifikatorer
urn:nbn:se:liu:diva-19884 (URN)10.1016/j.sse.2009.04.014 (DOI)
Anmärkning
Original Publication: Bouchaib Adnane, Yi-Fan Lai, Jia-Min Shieh, Per-Olof Holtz and Wei-Xin Ni, Photoluminescence study of nanocrystalline-Si(Ge) embedded in mesoporous silica, 2009, SOLID-STATE ELECTRONICS, (53), 8, 862-864. http://dx.doi.org/10.1016/j.sse.2009.04.014 Copyright: Elsevier Science B.V., Amsterdam. http://www.elsevier.com/ Tillgänglig från: 2009-08-14 Skapad: 2009-08-14 Senast uppdaterad: 2017-12-13
Adnane, B., Elfving, A., Zhao, M., Larsson, M., Magnuson, B. & Ni, W.-X. (2004). Mid/far-infrared detection using a MESFET with B-modulation doped Ge-dot/SiGe-well multiple stacks in the channel region. Paper presented at First IEEE International Conference on Group IV Photonics. IEEE
Öppna denna publikation i ny flik eller fönster >>Mid/far-infrared detection using a MESFET with B-modulation doped Ge-dot/SiGe-well multiple stacks in the channel region
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2004 (Engelska)Konferensbidrag, Publicerat paper (Refereegranskat)
Abstract [en]

Multiple modulation-doped Ge-dot/SiGe-QW stack structures were grown using MBE, and processed as FET devices for mid/far infrared detection. From a non-optimized device, a broadband photoresponse has been observed in the mid-infrared range of 3-15 μm. A peak responsivity was estimated to be as high as 100 mA/W at T= 20 K. This work indicates that SiGE QD/QW structures using the lateral transport geometry can be a potential candidate for photodetectors operating in far-infrared range.

Ort, förlag, år, upplaga, sidor
IEEE, 2004
Nationell ämneskategori
Naturvetenskap
Identifikatorer
urn:nbn:se:liu:diva-53202 (URN)10.1109/GROUP4.2004.1416702 (DOI)0-7803-8474-1 (ISBN)
Konferens
First IEEE International Conference on Group IV Photonics
Tillgänglig från: 2010-01-19 Skapad: 2010-01-19 Senast uppdaterad: 2010-04-28
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