Open this publication in new window or tab >>Show others...
2016 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 119, no 9Article in journal (Refereed) Published
Abstract [en]
By minority carrier transient spectroscopy on as-grown n-type bulk GaN produced by halide vapor phase epitaxy (HVPE) one hole trap labelled H1 (EV + 0.34 eV) has been detected. After 2 MeV-energy electron irradiation, the concentration of H1 increases and at fluences higher than 5×1014 cm-2, a second hole trap labelled H2 is observed. Simultaneously, the concentration of two electron traps, labelled T1 (EC - 0.12 eV) and T2 (EC - 0.23 eV) increases. By studying the increase of the concentration versus electron irradiation fluences, the introduction rate of T1 and T2 using 2 MeV-energy electrons was determined to 7X10-3 cm-1 and 0.9 cm-1, respectively. Due to the low introduction rate of T1 and the low threading dislocation density in the HVPE bulk GaN material, it is suggested that the defect is associated with a primary defect decorating extended structural defects. The high introduction rate of the trap H1 suggests that the H1 defect is associated with a primary intrinsic defect or a complex.
Keyword
Deep level, GaN, DLTS, irradiation
National Category
Physical Sciences
Identifiers
urn:nbn:se:liu:diva-121709 (URN)10.1063/1.4943029 (DOI)000372351900075 ()
Note
Funding agencies: Swedish Research Council (VR); Swedish Energy Agency
Vid tiden för disputation förelåg publikationen som manuskript
2015-10-022015-10-022017-12-01Bibliographically approved