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Isberg, Peter
Publications (3 of 3) Show all publications
Isberg, P., Eklund, P., Emmerlich, J., Hultman, L., Högberg, H. & Ljungcrantz, H. (2005). Amorphous and nanocomposite MAX compounds for wear protective coatings on components and tools as well as electrical contacts. WO 2005/038985 A2.
Open this publication in new window or tab >>Amorphous and nanocomposite MAX compounds for wear protective coatings on components and tools as well as electrical contacts
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2005 (English)Patent (Other (popular science, discussion, etc.))
National Category
Natural Sciences
Identifiers
urn:nbn:se:liu:diva-24518 (URN)6650 (Local ID)6650 (Archive number)6650 (OAI)
Patent
WO 2005/038985 A2 (2005-04-28)
Available from: 2009-10-07 Created: 2009-10-07 Last updated: 2016-08-31
Eklund, P., Emmerlich, J., Högberg, H., Wilhelmsson, O., Isberg, P., Birch, J., . . . Hultman, L. (2005). Structural, electrical, and mechanical properties of nc-TiC/a-SiC nanocomposite thin films. Journal of Vacuum Science & Technology B, 23(6), 2486-2495
Open this publication in new window or tab >>Structural, electrical, and mechanical properties of nc-TiC/a-SiC nanocomposite thin films
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2005 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 23, no 6, p. 2486-2495Article in journal (Refereed) Published
Abstract [en]

We have synthesized Ti–Si–C nanocomposite thin films by dc magnetron sputtering from a Ti3SiC2 compound target in an Ar discharge on Si(100), Al2O3(0001), and Al substrates at temperatures from room temperature to 300  °C. Electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy showed that the films consisted of nanocrystalline (nc-) TiC and amorphous (a-) SiC, with the possible presence of a small amount of noncarbidic C. The growth mode was columnar, yielding a nodular film-surface morphology. Mechanically, the films exhibited a remarkable ductile behavior. Their nanoindentation hardness and E-modulus values were 20 and 290  GPa, respectively. The electrical resistivity was 330  µ  cm for optimal Ar pressure (4  mTorr) and substrate temperature (300  °C). The resulting nc-TiC/a-SiC films performed well as electrical contact material. These films' electrical-contact resistance against Ag was remarkably low, 6  µ at a contact force of 800  N compared to 3.2  µ for Ag against Ag. The chemical stability of the nc-TiC/a-SiC films was excellent, as shown by a Battelle flowing mixed corrosive-gas test, with no N, Cl, or S contaminants entering the bulk of the films.

Keyword
titanium compounds, silicon compounds, wide band gap semiconductors, nanocomposites, amorphous semiconductors, thin films, sputter deposition, electron microscopy, X-ray diffraction, X-ray photoelectron spectra, surface morphology, ductility, indentation, hardness, electrical resistivity, electrical contacts, contact resistance
National Category
Engineering and Technology
Identifiers
urn:nbn:se:liu:diva-14473 (URN)10.1116/1.2131081 (DOI)
Available from: 2007-05-14 Created: 2007-05-14 Last updated: 2017-12-13
Eklund, P., Emmerlich, J., Högberg, H., Hultman, L., Wilhelmsson, O., Jansson, U. & Isberg, P. (2005). Synthesis and characterization of Ti-Si-C compounds for electrical contact applications. In: IEEE Holm Conference on Electrical Contacts,2005 (pp. 277-283). Piscataway: IEEE
Open this publication in new window or tab >>Synthesis and characterization of Ti-Si-C compounds for electrical contact applications
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2005 (English)In: IEEE Holm Conference on Electrical Contacts,2005, Piscataway: IEEE , 2005, p. 277-283Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
Piscataway: IEEE, 2005
National Category
Natural Sciences
Identifiers
urn:nbn:se:liu:diva-29430 (URN)14775 (Local ID)14775 (Archive number)14775 (OAI)
Available from: 2009-10-09 Created: 2009-10-09 Last updated: 2016-08-31
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