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Does hydrogen change the fullerenelike structure in CNx thin films?
National Physics Laboratory, Teddington.
Rutgers State University.
Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
University of Cambridge.
2009 (engelsk)Inngår i: JOURNAL OF VACUUM SCIENCE and TECHNOLOGY A, ISSN 0734-2101, Vol. 27, nr 5, s. 1227-1230Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

The authors have reported the structure of the nanoclusters in carbon nitride thin films before [D. Roy , Phys. Rev. B 70, 035406 (2004)]. In this work, effects of the addition of hydrogen in the deposition gas mixture on the structures of carbon nitride thin films prepared by magnetron sputtering were investigated using Raman spectroscopy. Raman measurements showed that the structures of carbon nanoclusters remained unaffected by the addition of hydrogen in the carbon nitride films. On the other hand, the structures of amorphous thin films were affected by the addition of hydrogen in the deposition gas mixture. These are explained in terms of changes in the ratios of the D-peak to the G-peak intensities and shifts in the G-peak centers.

sted, utgiver, år, opplag, sider
2009. Vol. 27, nr 5, s. 1227-1230
Emneord [en]
amorphous state, carbon compounds, hydrogen, nanostructured materials, Raman spectra, sputter deposition, thin films
HSV kategori
Identifikatorer
URN: urn:nbn:se:liu:diva-20747DOI: 10.1116/1.3207949OAI: oai:DiVA.org:liu-20747DiVA, id: diva2:235968
Tilgjengelig fra: 2009-09-18 Laget: 2009-09-18 Sist oppdatert: 2009-09-18

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