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Improved Ni ohmic contact on n-type 4H-SiC
Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.
Research Institute for Technical Physics, Budapest.
Sofia University.
Vise andre og tillknytning
1997 (engelsk)Inngår i: Journal of Electronic Materials, ISSN 0361-5235, Vol. 26, nr 3, s. 119-122Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

This paper presents the structural, chemical and electronic properties of Al/Ni/ Al-layers evaporated on 4H silicon carbide and then annealed at 1000°C for 5 min. The structure was investigated before and after annealing by transmission electron spectroscopy from cross-sectional specimens. With x-ray photoelectron spectroscopy, both element distribution and bonding energies were followed during sputtering through the alloyed metal-semiconductor contact. Voids are found in both annealed Ni/4H-SiC and Al/Ni/Al/4H-SiC contact layers, though closer to the metal-semiconductor interface in the former case. The first aluminum-layer is believed to prevent voids to be formed at the interface and also to reduce the oxide on the semiconductor surface. The contact was found to be ohmic with a specific contact resistance ρc - 1.8 × 10−5 Ωcm2 which is more than three times lower ρc than for the ordinary Ni/4H-SiC contact prepared in the same way.

sted, utgiver, år, opplag, sider
1997. Vol. 26, nr 3, s. 119-122
Emneord [en]
Al/Ni/Al/4H-SiC - transmission electron microscopy - x-ray photoelectron spectroscopy
HSV kategori
Identifikatorer
URN: urn:nbn:se:liu:diva-62871DOI: 10.1007/s11664-997-0136-2OAI: oai:DiVA.org:liu-62871DiVA, id: diva2:374924
Tilgjengelig fra: 2010-12-06 Laget: 2010-12-06 Sist oppdatert: 2013-02-06

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Hallin, ChristerYakimova, RositsaKakanakova-Georgieva, AneliaJanzén, Erik

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