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Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering
Linnaeus Univ, Sweden.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska fakulteten.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska fakulteten.ORCID-id: 0000-0002-6371-0638
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska fakulteten.
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2019 (engelsk)Inngår i: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 372, s. 9-15Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

In this work, amorphous thin films in Mg-Si-O-N system typically containing amp;gt; 15 at.% Mg and 35 at.% N were prepared in order to investigate especially the dependence of optical and mechanical properties on Mg composition. Reactive RF magnetron co-sputtering from magnesium and silicon targets were used for the deposition of Mg-Si-O-N thin films. Films were deposited on float glass, silica wafers and sapphire substrates in an Ar, N-2 and O-2 gas mixture. X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, spectroscopic ellipsometry, and nanoindentation were employed to characterize the composition, surface morphology, and properties of the films. The films consist of N and Mg contents up to 40 at.% and 28 at.%, respectively and have good adhesion to substrates and are chemically inert. The thickness and roughness of the films increased with increasing content of Mg. Both hardness (16-21 GPa) and reduced elastic modulus (120-176 GPa) are strongly correlated with the amount of Mg content. The refractive index up to 2.01 and extinction coefficient up to 0.18 were found to increase with Mg content. The optical band gap (3.1-4.3) decreases with increasing the Mg content. Thin film deposited at substrate temperature of 100 degrees C shows a lower value of hardness (10 GPa), refractive index (1.75), and higher values of reduced elastic modulus (124 GPa) as compared to the thin film deposited at 310 degrees C and 510 degrees C respectively, under identical synthesis parameters.

sted, utgiver, år, opplag, sider
Elsevier, 2019. Vol. 372, s. 9-15
Emneord [en]
Mg-Si-O-N thin films; Sputtering; High magnesium content; Hardness; Modulus; Refractive index; Band gap
HSV kategori
Identifikatorer
URN: urn:nbn:se:liu:diva-159122DOI: 10.1016/j.surfcoat.2019.05.015ISI: 000474676200002OAI: oai:DiVA.org:liu-159122DiVA, id: diva2:1339681
Merknad

Funding Agencies|VINNOVA [2015-04809]; AForsk Foundation [14-457]; European Research Council under the European Community/ERC [335383]; Swedish Foundation for Strategic Research (SSF); Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [2009 00971]

Tilgjengelig fra: 2019-07-30 Laget: 2019-07-30 Sist oppdatert: 2019-08-20

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