liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmosphere
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.ORCID iD: 0000-0002-0317-0190
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Nanoscale engineering. Linköping University, Faculty of Science & Engineering.
Show others and affiliations
Number of Authors: 82019 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 688, article id 137384Article in journal (Refereed) Published
Abstract [en]

W-B-C films were deposited on Si(100) substrates held at elevated temperature by reactive sputtering from a W target in Kr/trimethylboron (TMB) plasmas. Quantitative analysis by Xray photoelectron spectroscopy (XPS) shows that the films are W-rich between ~ 73 and ~ 93 at.% W. The highest metal content is detected in the film deposited with 1 sccm TMB. The C and B concentrations increase with increasing TMB flow to a maximum of ~18 and ~7 at.%, respectively, while the O content remains nearly constant at 2-3 at.%. Chemical bonding structure analysis performed after samples sputter-cleaning reveals C-W and B-W bonding and no detectable W-O bonds. During film growth with 5 sccm TMB and 500 o C or with 10 sccm TMB and 300-600 o C thin film X-ray diffraction shows the formation of cubic 100-oriented WC1-x with a possible solid solution of B. Lower flows and lower growth temperatures favor growth of W and W2C, respectively. Depositions at 700 and 800 o C result in the formation of WSi2 due to a reaction with the substrate. At 900 o C, XPS analysis shows ~96 at.% Si in the film due to Si interdiffusion. Scanning electron microscopy images reveal a fine-grained microstructure for the deposited WC1-x films. Nanoindentation gives hardness values in the range from ~23 to ~31 GPa and reduced elastic moduli between ~220 and 280 GPa in the films deposited at temperatures lower than 600 o C. At higher growth temperatures the hardness decreases by a factor of 3 to 4 following the formation of WSi2 at 700-800 o C and Si-rich surface at 900 o C.

Place, publisher, year, edition, pages
Elsevier, 2019. Vol. 688, article id 137384
Keywords [en]
W-B-C films, reactive magnetron sputtering, trimethylboron, nanoindentation, Xray photoelectron spectroscopy, thin film X-ray diffraction, Scanning Electron Microscope
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:liu:diva-160243DOI: 10.1016/j.tsf.2019.06.034ISI: 000485256500039Scopus ID: 2-s2.0-85067891667OAI: oai:DiVA.org:liu-160243DiVA, id: diva2:1351007
Available from: 2019-09-13 Created: 2019-09-13 Last updated: 2019-11-14Bibliographically approved

Open Access in DiVA

The full text will be freely available from 2021-06-22 08:00
Available from 2021-06-22 08:00

Other links

Publisher's full textScopusLink to full text at ArXiv.org

Authority records BETA

Magnuson, MartinTengdelius, LinaEriksson, FredrikSamuelsson, MattiasBroitman, EstebanGreczynski, GrzegorzHultman, LarsHögberg, Hans

Search in DiVA

By author/editor
Magnuson, MartinTengdelius, LinaEriksson, FredrikSamuelsson, MattiasBroitman, EstebanGreczynski, GrzegorzHultman, LarsHögberg, Hans
By organisation
Thin Film PhysicsFaculty of Science & EngineeringNanoscale engineering
In the same journal
Thin Solid Films
Inorganic Chemistry

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 55 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf