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Ionization of sputtered metals in high power pulsed magnetron sputtering
Linköpings universitet, Institutionen för fysik, kemi och biologi, Plasma och beläggningsfysik. Linköpings universitet, Tekniska högskolan.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Plasma och beläggningsfysik. Linköpings universitet, Tekniska högskolan.
Diamond Light Source, Rutherford Appleton Laboratory, Chilton, United Kingdom.
Materials Research Institute, Sheffield Hallam University, United Kingdom.
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2005 (Engelska)Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 23, nr 1, s. 18-22Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

The ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron sputtering and compared with a continuous direct current (dc) discharge using the same experimental setup except for the power source. Optical emission spectroscopy (OES) was used to study the optical emission from the plasma through a side window. The emission was shown to be dominated by emission from metal ions. The distribution of metal ionized states clearly differed from the distribution of excited states, and we suggest the presence of a hot dense plasma surrounded by a cooler plasma. Sputtered material was ionized close to the target and transported into a cooler plasma region where the emission was also recorded. Assuming a Maxwell–Boltzmann distribution of excited states the emission from the plasma was quantified. This showed that the ionic contribution to the recorded spectrum was over 90% for high pulse powers. Even at relatively low applied pulse powers, the recorded spectra were dominated by emission from ions. OES analysis of the discharge in a continuous dc magnetron discharge was also made, which demonstrated much lower ionization.

Ort, förlag, år, upplaga, sidor
2005. Vol. 23, nr 1, s. 18-22
Nyckelord [en]
ionisation, excited states, sputter deposition, plasma deposition, plasma diagnostics
Nationell ämneskategori
Naturvetenskap
Identifikatorer
URN: urn:nbn:se:liu:diva-13974DOI: 10.1116/1.1818135OAI: oai:DiVA.org:liu-13974DiVA, id: diva2:22364
Tillgänglig från: 2006-09-12 Skapad: 2006-09-12 Senast uppdaterad: 2017-12-13
Ingår i avhandling
1. Fundamentals of High Power Impulse Magnetron Sputtering
Öppna denna publikation i ny flik eller fönster >>Fundamentals of High Power Impulse Magnetron Sputtering
2006 (Engelska)Doktorsavhandling, sammanläggning (Övrigt vetenskapligt)
Abstract [en]

In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. Thin films grown by ionized physical vapor deposition (I-PVD) have lately shown promising results regarding film structure and adhesion. High power impulse magnetron sputtering (HIPIMS) is a relatively newly developed technique, which relies on the creation of a dense plasma in front of the sputtering target to produce a large fraction of ions of the sputtered material. In HIPIMS, high power pulses with a length of ~100 μs are applied to a conventional planar magnetron. The highly energetic nature of the discharge, which involves power densities of several kW/cm2, creates a dense plasma in front of the target, which allows for a large fraction of the sputtered material to be ionized.

The work presented in this thesis involves plasma analysis using electrostatic probes, optical emission spectroscopy (OES), magnetic probes, energy resolved mass spectrometry, and other fundamental observation techniques. These techniques used together are powerful plasma analysis tools, and used together give a good overview of the plasma properties is achieved.

from the erosion zone of the magnetron. The peak plasma density during the active cycle of the discharge exceeds 1019 electrons/m3. The expanding plasma is reflected by the chamber wall back into the center part of the chamber, resulting in a second density peak several hundreds of μs after the pulse is turned off.

Optical emission spectroscopy (OES) measurements of the plasma indicate that the degree of ionization of sputtered Ti is very high, over 90 % in the peak of the pulse. Even at relatively low applied target power (~200 W/cm2 peak power) the recorded spectrum is totally dominated by radiation from ions. The recorded HIPIMS spectra were compared to a spectrum taken from a DC magnetron discharge, showing a completely different appearance.

Magnetic field measurements performed with a coil type probe show significant deformation in the magnetic field of the magnetrons during the pulse. Spatially resolved measurements show evidence of a dense azimuthally E×B drifting current. Circulating currents mainly flow within 2 away cm from the target surface in an early part of the pulse, to later diffuse axially into the chamber and decrease in intensity. We record peak current densities of the E×B drift to be of the order of 105 A/m2.

A mass spectrometry (MS) study of the plasma reveals that the HIPIMS discharge contains a larger fraction of highly energetic ions as compared to the continuous DC discharge. Especially ions of the target material are more energetic. Time resolved studies show broad distributions of ion energies in the early stage of the discharge, which quickly narrows down after pulse switch-off. Ti ions with energies up to 100 eV are detected. The time average plasma contains mainly low energy Ar ions, but during the active phase of the discharge, the plasma is highly metallic. Shortly after pulse switch-on, the peak value of the Ti1+/Ar1+ ratio is over 2. The HIPIMS discharge also contains a significant amount of doubly charged ions.

Ort, förlag, år, upplaga, sidor
Institutionen för fysik, kemi och biologi, 2006
Serie
Linköping Studies in Science and Technology. Dissertations, ISSN 0345-7524 ; 1014
Nyckelord
Plasma, Pulsed plasma, High Power Pulsed Magnetron Sputtering, Plasma Characterization
Nationell ämneskategori
Fysik
Identifikatorer
urn:nbn:se:liu:diva-7359 (URN)91-85523-96-8 (ISBN)
Disputation
2006-04-13, Planck, Fysikhuset, Campus Valla, Linköpings universitet, Linköping, 09:15 (Engelska)
Opponent
Handledare
Tillgänglig från: 2006-09-12 Skapad: 2006-09-12 Senast uppdaterad: 2020-03-24

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Böhlmark, JohanAlami, JonesHelmersson, Ulf

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Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
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