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D-II PL intensity dependence on dose, implantation temperature and implanted species in 4H-and 6H-SiC
Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
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2003 (Engelska)Ingår i: Materials Science Forum, Vols. 433-436, 2003, Vol. 433-4, s. 345-348Konferensbidrag, Publicerat paper (Refereegranskat)
Abstract [en]

In most semi-conductor processing ion implantation is a key technology. The drawback of ion implantation is that a great deal of lattice defects, such as vacancies, interstitials, anti sites and complexes, are introduced. The annealing behaviour of these defects is important for the viability of ion implantation as a commonly used method. In SiC a defect that is only seen after ion implantation and not after irradiation with neutrons or electrons is the D-II defect. The use of Si or C as implanted species have made it possible to investigate the D-II photoluminescence (PL) intensity dependence on an excess of either of the two constituents in SiC. The effect of performing a hot implant at 600degreesC compared to a room temperature implant was also looked into. The D-II PL intensity was measured after a 1500degreesC anneal. When the implantation was performed at room temperature the C implanted samples showed a significantly higher D-II luminescence than the Si implanted. This makes it tempting to assume that a surplus of C and likely C interstitials are involved in the defect formation. However, when the implantation is done at 600degreesC the difference between Si and C implanted samples almost disappears and a slightly higher D-II intensity can be seen in the Si implanted samples. This effect may be due to the mobility of C interstitials at temperatures above 500degreesC. This clearly demonstrates the effect of hot implantation that there is a major change in D-II PL intensity even after a 1500degreesC anneal.

Ort, förlag, år, upplaga, sidor
2003. Vol. 433-4, s. 345-348
Nyckelord [en]
annealing, D-II, ion implantation, SiC
Nationell ämneskategori
Teknik och teknologier
Identifikatorer
URN: urn:nbn:se:liu:diva-48547OAI: oai:DiVA.org:liu-48547DiVA, id: diva2:269443
Konferens
ECSCRM2002
Tillgänglig från: 2009-10-11 Skapad: 2009-10-11 Senast uppdaterad: 2010-12-06

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Carlsson, FredrikJanzén, Erik

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Carlsson, FredrikJanzén, Erik
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Tekniska högskolanInstitutionen för fysik, kemi och biologiHalvledarmaterial
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