liu.seSök publikationer i DiVA
Ändra sökning
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
Characterisation and defects in silicon carbide
Linkoping Univ, Dept Phys & Measurement Technol, SE-58183 Linkoping, Sweden ABB Corp, SE-72178 Vasteras, Sweden Okmet AB, SE-58183 Linkoping, Sweden.
Linkoping Univ, Dept Phys & Measurement Technol, SE-58183 Linkoping, Sweden ABB Corp, SE-72178 Vasteras, Sweden Okmet AB, SE-58183 Linkoping, Sweden.
Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial.
Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
Visa övriga samt affilieringar
2002 (Engelska)Ingår i: Materials Science Forum, Vols. 389-393, 2002, Vol. 389-3Konferensbidrag, Publicerat paper (Refereegranskat)
Abstract [en]

In this work we present experimental results of several defects in 4H Sic that are of interest both from a fundamental and physical point of view. And also of great importance for device applications utilizing the Sic material. These defects include the temperature stable so called D1 defect, which is created after irradiation. This optical emission has been identified as an isoelectronic defect bound at a hole attractive pseudodonor, and we have been able to correlate this to the electrically observed hole trap HS1 seen in minority carrier transient spectroscopy (MCTS). It also includes the UD1 defect observed using absorption and FTIR and which is believed to be responsible for the semi-insulating behavior of material grown by the High temperature, HTCVD technique. Finally, we have described the formation and proper-ties of critical, generated defect in high power Sic bipolar devices. This is identified as a stacking fault in the Sic basal plane, using mainly white beam synchrotron Xray topography. The stacking fault is both optically and electrically active, by forming extended local potential reduction of the conduction band.

Ort, förlag, år, upplaga, sidor
2002. Vol. 389-3
Nyckelord [en]
carrier lifetime, defects, dislocations, stacking faults
Nationell ämneskategori
Teknik och teknologier
Identifikatorer
URN: urn:nbn:se:liu:diva-48795OAI: oai:DiVA.org:liu-48795DiVA, id: diva2:269691
Konferens
ICSCRM2001
Tillgänglig från: 2009-10-11 Skapad: 2009-10-11 Senast uppdaterad: 2015-09-22

Open Access i DiVA

Fulltext saknas i DiVA

Personposter BETA

Storasta, LiutaurasCarlsson, FredrikMagnusson, BjörnPozina, GaliaJanzén, Erik

Sök vidare i DiVA

Av författaren/redaktören
Storasta, LiutaurasCarlsson, FredrikMagnusson, BjörnPozina, GaliaJanzén, Erik
Av organisationen
Tekniska högskolanHalvledarmaterialInstitutionen för fysik, kemi och biologi
Teknik och teknologier

Sök vidare utanför DiVA

GoogleGoogle Scholar

urn-nbn

Altmetricpoäng

urn-nbn
Totalt: 151 träffar
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf