liu.seSearch for publications in DiVA
Endre søk
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
3-D computational modeling of SiC epitaxial growth in a hot wall reactor
ABB Corp Res, SE-72178 Vasteras, Sweden Royal Inst Technol, Faxen Lab, SE-10044 Stockholm, Sweden Linkoping Univ, IFM, SE-58183 Linkoping, Sweden.
ABB Corp Res, SE-72178 Vasteras, Sweden Royal Inst Technol, Faxen Lab, SE-10044 Stockholm, Sweden Linkoping Univ, IFM, SE-58183 Linkoping, Sweden.
Linköpings universitet, Tekniska högskolan. Linköpings universitet, Institutionen för fysik, kemi och biologi.
ABB Corp Res, SE-72178 Vasteras, Sweden Royal Inst Technol, Faxen Lab, SE-10044 Stockholm, Sweden Linkoping Univ, IFM, SE-58183 Linkoping, Sweden.
2000 (engelsk)Inngår i: Materials Science Forum, ISSN 0255-5476, E-ISSN 1662-9752, Vol. 338-3, s. 149-152Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

A three-dimensional computational model for chemical vapor deposition (CVD) of silicon carbide (SiC) in a hot wall reactor is developed, where the susceptor is tapered with a rectangular cross-section. The present work focuses on the advection-diffusion-reaction process in the susceptor. The precursors are propane and silane, and the carrier gas is hydrogen with mass fraction higher than 98%. Computed growth rates under different system pressures and precursor concentrations are compared with the experimental data measured on samples grown in the Linkoping CVD reactor. The gas composition distribution and the growth rate profile are shown. Dependence of the growth rate on precursor concentrations is investigated.

sted, utgiver, år, opplag, sider
2000. Vol. 338-3, s. 149-152
Emneord [en]
CVD, epitaxial growth, hot-wall, numerical simulation
HSV kategori
Identifikatorer
URN: urn:nbn:se:liu:diva-49430OAI: oai:DiVA.org:liu-49430DiVA, id: diva2:270326
Tilgjengelig fra: 2009-10-11 Laget: 2009-10-11 Sist oppdatert: 2017-12-12

Open Access i DiVA

Fulltekst mangler i DiVA

Personposter BETA

Hallin, Christer

Søk i DiVA

Av forfatter/redaktør
Hallin, Christer
Av organisasjonen
I samme tidsskrift
Materials Science Forum

Søk utenfor DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric

urn-nbn
Totalt: 54 treff
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf