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Characterization of ohmic and Schottky contacts on SiC
Bulgarian Academy of Sciences, Sofia.
Bulgarian Academy of Sciences, Sofia.
Thomson-CSF/LCR, Orsay Cedex, France.
Thomson-CSF/LCR, Orsay Cedex, France.
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1999 (Engelska)Ingår i: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 343-344, s. 637-641Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

The interface chemistry of nickel and tungsten based contacts on SiC has been investigated by XPS on as-deposited samples and after contact formation. After annealing at 950 °C for 10 min, Ni/SiC and Ni/Si/SiC ohmic contacts are formed due to the chemical reactions, as a result of which Ni2Si appears. However, Ni/Si (instead of pure Ni) deposition on SiC leads to modification of the diffusion processes and formation of a contact layer free of carbon. After annealing at 1200 °C for 4 min, the WN (W)/SiC systems are characterized by strong interface reactions resulting in W5Si3 and W2C formation in the contact layer. The 800 °C annealed WN/SiC contact is characterized by a chemically inert interface, and is found to be of a Schottky type.

Ort, förlag, år, upplaga, sidor
1999. Vol. 343-344, s. 637-641
Nyckelord [en]
Contacts; Depth profiling; Nickel; Silicon carbide; Tungsten; X-ray photoelectron spectroscopy
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Naturvetenskap
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URN: urn:nbn:se:liu:diva-62867DOI: 10.1016/S0040-6090(98)01668-XOAI: oai:DiVA.org:liu-62867DiVA, id: diva2:374912
Tillgänglig från: 2010-12-06 Skapad: 2010-12-06 Senast uppdaterad: 2017-12-11

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