liu.seSök publikationer i DiVA
Ändra sökning
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.ORCID-id: 0000-0002-4898-5115
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.ORCID-id: 0000-0002-2837-3656
2010 (Engelska)Ingår i: IEEE TRANSACTIONS ON PLASMA SCIENCE, ISSN 0093-3813, Vol. 38, nr 11, s. 3046-3056Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

CrNx (0 andlt;= x andlt;= 0.91) films synthesized using high-power pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission strength from the Cr ions relative to Cr neutrals, in agreement with the predictions of the target-pathway model. The low deposition rate in HiPIMS is thus a direct consequence of the high ionization level (similar to 56%) of the target material and effective capturing of Cr ions by the cathode potential. Although the HiPIMS deposition rate did not exceed 40% of the DCMS rate, the drop in the relative deposition rate upon increasing the N-2-to-Ar flow ratio, f(N2/Ar), was found to be similar for both sputtering techniques. Films prepared by HiPIMS contained similar amounts of atomic nitrogen as the dc-sputtered samples grown at the same f(N2/Ar), indicating that the nitride formation at the substrate takes place mostly during the time period of the high-power pulses, and the N-2 uptake between the pulses is negligible. The microstructure evolution in the two types of CrNx films, however, differed clearly from each other. A combination of a high substrate bias and a high flux of doubly charged Cr ions present during the HiPIMS discharge led to a disruption of the grain growth and renucleation, which resulted in column-free films with nanosized grains not observed in the conventional DCMS-based process. The comparison of nanoindentation hardness as a function of f(N2/Ar) revealed superior properties of HiPIMS-sputtered films in the entire range of gas compositions.

Ort, förlag, år, upplaga, sidor
IEEE Institute of Electrical and Electronics , 2010. Vol. 38, nr 11, s. 3046-3056
Nyckelord [en]
CrN, high-power impulse magnetron sputtering (HiPIMS), high-power pulsed magnetron sputtering, magnetron sputtering
Nationell ämneskategori
Teknik och teknologier
Identifikatorer
URN: urn:nbn:se:liu:diva-63154DOI: 10.1109/TPS.2010.2071885ISI: 000284089300007OAI: oai:DiVA.org:liu-63154DiVA, id: diva2:376664
Anmärkning
©2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. Grzegorz Greczynski, Jens Jensen and Lars Hultman, CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study, 2010, IEEE TRANSACTIONS ON PLASMA SCIENCE, (38), 11, 3046-3056. http://dx.doi.org/10.1109/TPS.2010.2071885 Tillgänglig från: 2010-12-13 Skapad: 2010-12-13 Senast uppdaterad: 2016-08-31

Open Access i DiVA

fulltext(856 kB)3895 nedladdningar
Filinformation
Filnamn FULLTEXT01.pdfFilstorlek 856 kBChecksumma SHA-512
6e529aa8a0c78b5e10d897678ced204c816e9bbbcd1c2da9ffe2b327b542ff83b4af7d05bce77d1fab93f72933c19ad92add3ae8762a8ec6380295ffd3b33ac9
Typ fulltextMimetyp application/pdf

Övriga länkar

Förlagets fulltext

Personposter BETA

Greczynski, GrzegorzJensen, JensHultman, Lars

Sök vidare i DiVA

Av författaren/redaktören
Greczynski, GrzegorzJensen, JensHultman, Lars
Av organisationen
TunnfilmsfysikTekniska högskolan
Teknik och teknologier

Sök vidare utanför DiVA

GoogleGoogle Scholar
Totalt: 3895 nedladdningar
Antalet nedladdningar är summan av nedladdningar för alla fulltexter. Det kan inkludera t.ex tidigare versioner som nu inte längre är tillgängliga.

doi
urn-nbn

Altmetricpoäng

doi
urn-nbn
Totalt: 336 träffar
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf