liu.seSök publikationer i DiVA
Ändra sökning
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
On the effect of silicon in CVD of sp2 hybridized boron nitride thin films
Linköpings universitet, Institutionen för fysik, kemi och biologi. Linköpings universitet, Tekniska högskolan.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.ORCID-id: 0000-0002-7171-5383
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Halvledarmaterial. Linköpings universitet, Tekniska högskolan.ORCID-id: 0000-0001-5768-0244
2013 (Engelska)Ingår i: CrystEngComm, ISSN 1466-8033, E-ISSN 1466-8033, Vol. 15, nr 3, s. 455-458Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

The influence of silicon on the growth of epitaxial rhombohedral boron nitride (r-BN) films deposited on sapphire (0001) by chemical vapor deposition is investigated. X-ray diffraction measurements and secondary ion mass spectrometry show that silicon favors the formation of r-BN and is incorporated into the film.

Ort, förlag, år, upplaga, sidor
Royal Society of Chemistry , 2013. Vol. 15, nr 3, s. 455-458
Nationell ämneskategori
Teknik och teknologier
Identifikatorer
URN: urn:nbn:se:liu:diva-87243DOI: 10.1039/c2ce26423dISI: 000312197600006OAI: oai:DiVA.org:liu-87243DiVA, id: diva2:587223
Anmärkning

Funding Agencies|Swedish Research Council|VR 621-2009-5264VR 622-2008-1247|

Tillgänglig från: 2013-01-14 Skapad: 2013-01-14 Senast uppdaterad: 2017-12-06
Ingår i avhandling
1. Chemical Vapour Deposition of sp2 Hybridised Boron Nitride
Öppna denna publikation i ny flik eller fönster >>Chemical Vapour Deposition of sp2 Hybridised Boron Nitride
2014 (Engelska)Doktorsavhandling, sammanläggning (Övrigt vetenskapligt)
Abstract [en]

The aim of this work was to develop a chemical vapour deposition process and understand the growth of sp2 hybridised Boron Nitride (sp2-BN). Thus, the growth on different substrates together with the variation of growth parameters was investigated in details and is presented in the papers included in this thesis. Deposited films of sp2-BN were characterised with the purpose to determine optimal deposition process parameters for the growth of high crystal quality thin films with further investigations of chemical composition, morphology and other properties important for the implementation of this material towards electronic, optoelectronic devices and devices based on graphene/BN heterostructures.

For the growth of sp2-BN triethyl boron and ammonia were employed as B and N precursors, respectively. Pure H2 as carrier gas is found to be necessary for the growth of crystalline sp2-BN. Addition of small amount of silane to the gas mixture improves the crystalline quality of the growing sp2-BN film.

It was observed that for the growth of crystalline sp2-BN on c-axis oriented α-Al2O3 a thin and strained AlN buffer layer is needed to support epitaxial growth of sp2-BN, while it was possible to deposit rhombohedral BN (r-BN) on various polytypes of SiC without the need for a buffer layer. The growth temperature suitable for the growth of  crystalline sp2-BN is 1500 °C. Nevertheless, the growth of crystalline sp2-BN was also observed on α-Al2O3 with an AlN buffer layer at a lower temperature of 1200 °C. Growth at this low temperature was found to be hardly controllable due to the low amount of Si that is necessary at this temperature and its accumulation in the reaction cell. When SiC was used as a substrate at the growth temperature of 1200 °C, no crystalline sp2-BN was formed, according to X-ray diffraction.

Crystalline structure investigations of the deposited films showed formation of twinned r-BN on both substrates used. Additionally, it was found that the growth on α-Al2O3 with an AlN buffer layer starts with the formation of hexagonal BN (h-BN) for a thickness of around 4 nm. The formation of h-BN was observed at growth temperatures of 1200 °C and 1500 °C on α-Al2O3 with AlN buffer layer while there were no traces of h-BN found in the films deposited on SiC substrates in the temperature range between 1200 °C and 1700 °C. As an explanation for such growth behaviour, reproduction of the substrate crystal stacking is suggested.  Nucleation and growth mechanism are investigated and presented in the papers included in this thesis.

Ort, förlag, år, upplaga, sidor
Linköping: Linköping University Electronic Press, 2014. s. 54
Serie
Linköping Studies in Science and Technology. Thesis, ISSN 0280-7971 ; 1632
Nationell ämneskategori
Fysik
Identifikatorer
urn:nbn:se:liu:diva-112580 (URN)10.3384/diss.diva-112580 (DOI)978-91-7519-193-5 (ISBN)
Disputation
2015-02-10, Planck, Fysikhuset, Campus Valla, Linköpings universitet, Linköping, 09:15 (Engelska)
Opponent
Handledare
Tillgänglig från: 2014-12-04 Skapad: 2014-12-04 Senast uppdaterad: 2019-10-12Bibliografiskt granskad

Open Access i DiVA

Fulltext saknas i DiVA

Övriga länkar

Förlagets fulltext

Personposter BETA

Pedersen, HenrikHögberg, HansHenry, Anne

Sök vidare i DiVA

Av författaren/redaktören
Pedersen, HenrikHögberg, HansHenry, Anne
Av organisationen
Institutionen för fysik, kemi och biologiTekniska högskolanHalvledarmaterialTunnfilmsfysik
I samma tidskrift
CrystEngComm
Teknik och teknologier

Sök vidare utanför DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetricpoäng

doi
urn-nbn
Totalt: 115 träffar
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf