liu.seSök publikationer i DiVA
Ändra sökning
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
Metal versus rare-gas ion irradiation during Ti1-xAlxN film growth by hybrid high power pulsed magnetron/dc magnetron co-sputtering using synchronized pulsed substrate bias
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.ORCID-id: 0000-0002-4898-5115
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
Linköpings universitet, Institutionen för fysik, kemi och biologi, Tunnfilmsfysik. Linköpings universitet, Tekniska högskolan.
Visa övriga samt affilieringar
2012 (Engelska)Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 30, nr 6Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

Metastable NaCl-structure Ti1-xAlxN is employed as a model system to probe the effects of metal versus rare-gas ion irradiation during film growth using reactive high-power pulsed magnetron sputtering (HIPIMS) of Al and dc magnetron sputtering of Ti. The alloy film composition is chosen to be x = 0.61, near the kinetic solubility limit at the growth temperature of 500 degrees C. Three sets of experiments are carried out: a -60V substrate bias is applied either continuously, in synchronous with the full HIPIMS pulse, or in synchronous only with the metal-rich-plasma portion of the HIPIMS pulse. Alloy films grown under continuous dc bias exhibit a thickness-invariant small-grain, two-phase nanostructure (wurtzite AlN and cubic Ti1-xAlxN) with random orientation, due primarily to intense Ar+ irradiation leading to Ar incorporation (0.2 at. %), high compressive stress (-4.6 GPa), and material loss by resputtering. Synchronizing the bias with the full HIPIMS pulse results in films that exhibit much lower stress levels (-1.8GPa) with no measureable Ar incorporation, larger grains elongated in the growth direction, a very small volume fraction of wurtzite AlN, and random orientation. By synchronizing the bias with the metal-plasma phase of the HIPIMS pulses, energetic Ar+ ion bombardment is greatly reduced in favor of irradiation predominantly by Al+ ions. The resulting films are single phase with a dense competitive columnar structure, strong 111 orientation, no measureable trapped Ar concentration, and even lower stress (-0.9 GPa). Thus, switching from Ar+ to Al+ bombardment, while maintaining the same integrated incident ion/metal ratio, eliminates phase separation, minimizes renucleation during growth, and reduces the high concentration of residual point defects, which give rise to compressive stress.

Ort, förlag, år, upplaga, sidor
American Vacuum Society , 2012. Vol. 30, nr 6
Nyckelord [en]
aluminium compounds, compressive strength, ion beam effects, nanofabrication, nanostructured materials, nucleation, solubility, sputter deposition, thin films, titanium compounds
Nationell ämneskategori
Teknik och teknologier
Identifikatorer
URN: urn:nbn:se:liu:diva-88465DOI: 10.1116/1.4750485ISI: 000311458500019OAI: oai:DiVA.org:liu-88465DiVA, id: diva2:604048
Anmärkning

Funding Agencies|Swedish VINN Excellence Center on Functional Nanoscale Materials (FunMat)||

Tillgänglig från: 2013-02-07 Skapad: 2013-02-07 Senast uppdaterad: 2017-12-06

Open Access i DiVA

fulltext(509 kB)765 nedladdningar
Filinformation
Filnamn FULLTEXT01.pdfFilstorlek 509 kBChecksumma SHA-512
32e89af9e269455928bfc6ea0ca94c6a724fefd0fc87b0621fc08e24c07553e72967c0aa63546f15591cd2b4e039ac25aa72d6232c258aab5ae5212915d2e760
Typ fulltextMimetyp application/pdf

Övriga länkar

Förlagets fulltext

Personposter BETA

Greczynski, GrzegorzLu, JunJensen, JensPetrov, IvanGreene, Joseph E.Hultman, Lars

Sök vidare i DiVA

Av författaren/redaktören
Greczynski, GrzegorzLu, JunJensen, JensPetrov, IvanGreene, Joseph E.Hultman, Lars
Av organisationen
TunnfilmsfysikTekniska högskolan
I samma tidskrift
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Teknik och teknologier

Sök vidare utanför DiVA

GoogleGoogle Scholar
Totalt: 765 nedladdningar
Antalet nedladdningar är summan av nedladdningar för alla fulltexter. Det kan inkludera t.ex tidigare versioner som nu inte längre är tillgängliga.

doi
urn-nbn

Altmetricpoäng

doi
urn-nbn
Totalt: 487 träffar
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf