liu.seSök publikationer i DiVA
Ändra sökning
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
Photo-induced C-C reactions on insulators towards photolithography of graphene nanoarchitectures
Technishe Universität München, Garching, Germany.
Technishe Universität München, Garching, Germany.
Max-Planck-Institut für Polymerforschung, Mainz, Germany.
Karlsruher Institut für Technologie, Eggenstein-Leopoldshafen, Germany.
Visa övriga samt affilieringar
2014 (Engelska)Ingår i: Journal of the American Chemical Society, ISSN 0002-7863, E-ISSN 1520-5126, Vol. 136, s. 4651-4658Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

On-surface chemistry for atomically precise sp2 macromolecules requires top-down lithographic methods on insulating surfaces in order to pattern the long-range complex architectures needed by the semiconductor industry. Here, we fabricate sp2-carbon nm-thin films on insulators and under ultra-high vacuum (UHV) conditions from photo-coupled brominated precursors. We reveal that covalent coupling is initiated by C-Br bond cleavage through photon energies exceeding 4.4 eV, as monitored by laser desorption ionization (LDI) mass spectrometry (MS) and X-ray photoelectron spectroscopy (XPS). Density functional theory (DFT) gives insight into the mechanisms of C-Br scission and C-C coupling processes. Further, unreacted material can be sublimed and the coupled sp2-carbon precursors can be graphitized by e-beam treatment at 500°C, demonstrating promising applications in photolithography of graphene nanoarchitectures. Our results present UV-induced reactions on insulators for the formation of all sp2-carbon architectures, thereby converging top-down lithography and bottom-up on-surface chemistry into technology.

Ort, förlag, år, upplaga, sidor
American Chemical Society (ACS), 2014. Vol. 136, s. 4651-4658
Nationell ämneskategori
Organisk kemi Fysikalisk kemi Polymerkemi Teoretisk kemi
Identifikatorer
URN: urn:nbn:se:liu:diva-104733DOI: 10.1021/ja412868wISI: 000333551800033OAI: oai:DiVA.org:liu-104733DiVA, id: diva2:698710
Tillgänglig från: 2014-02-24 Skapad: 2014-02-24 Senast uppdaterad: 2017-12-05

Open Access i DiVA

Fulltext saknas i DiVA

Övriga länkar

Förlagets fulltext

Personposter BETA

Björk, Jonas

Sök vidare i DiVA

Av författaren/redaktören
Björk, Jonas
Av organisationen
BeräkningsfysikTekniska högskolan
I samma tidskrift
Journal of the American Chemical Society
Organisk kemiFysikalisk kemiPolymerkemiTeoretisk kemi

Sök vidare utanför DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetricpoäng

doi
urn-nbn
Totalt: 197 träffar
RefereraExporteraLänk till posten
Permanent länk

Direktlänk
Referera
Referensformat
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Annat format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annat språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf