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Simple Chemical Vapor Deposition Experiment
Linköpings universitet, Institutionen för fysik, kemi och biologi, Kemi. Linköpings universitet, Tekniska högskolan.ORCID-id: 0000-0002-7171-5383
2014 (engelsk)Inngår i: Journal of Chemical Education, ISSN 0021-9584, E-ISSN 1938-1328, Vol. 91, nr 9, s. 1495-1497Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

Chemical vapor deposition (CVD) is a process commonly used for the synthesis of thin films for several important technological applications, for example, microelectronics, hard coatings, and smart windows. Unfortunately, the complexity and prohibitive cost of CVD equipment makes it seldom available for undergraduate chemistry students. Here, a simple CVD experiment designed to give hands-on experience with this technique using common chemical laboratory equipment is outlined. The experiment is suitable for an upper-level or graduate course on inorganic chemistry, materials chemistry or materials science. In the experiment, crystalline thin films of titanium nitride (TiN) are deposited using titanium tetrachloride, hydrogen, and nitrogen gas in an experimental setup based on a tithe furnace and common safety flasks. Typically, crystalline TiN films with some incorporation of TiO2 are deposited in this experiment. The experiment has been used in the teaching of both master and doctorial students.

sted, utgiver, år, opplag, sider
American Chemical Society, Division of Chemical Education , 2014. Vol. 91, nr 9, s. 1495-1497
Emneord [en]
Upper-Division Undergraduate; Laboratory Instructions; Inorganic Chemistry; Hands-On Learning/Manipulatives; Laboratory Equipment/Apparatus; Materials Science
HSV kategori
Identifikatorer
URN: urn:nbn:se:liu:diva-111455DOI: 10.1021/ed500183kISI: 000341963200038OAI: oai:DiVA.org:liu-111455DiVA, id: diva2:757256
Tilgjengelig fra: 2014-10-21 Laget: 2014-10-17 Sist oppdatert: 2017-12-05

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