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Nonvolatile Memory Capacitors Based on Double Gold nanocrystals and HfO2 Tunneling and HfNO/HfTiO Laminate Control High-k Insulator Layers.
Technion Israel Institute Technology, Israel.
Technion Israel Institute Technology, Israel.
Technion Israel Institute Technology, Israel.
Technion Israel Institute Technology, Israel.
Vise andre og tillknytning
2009 (engelsk)Inngår i: PHYSICS AND TECHNOLOGY OF HIGH-K GATE DIELECTRICS 7, Electrochemical Society , 2009, Vol. 25, nr 6, s. 465-471Konferansepaper, Publicerat paper (Fagfellevurdert)
Abstract [en]

We describe all high-k, nonvolatile metal-insulator-semiconductor memory capacitor with an equivalent oxide thickness of 7.3 nm that makes use of two gold nanocrystal charge storage layers. The device exhibits a large memory hysteresis of about 0.75 V and 15 V, respectively at a sweeping gate voltages of +/- 1V and + 11V to -8V with a maximum storage charge density of similar to 2.75x10(13) cm(-2). The leakage current density is 3.6x10(-5) A/cm(2) at -10 V and the breakdown voltage is in the range of 12.3V - 13.3V. A large memory hysteresis window of similar to 10 V was also observed after more than 10 hours of consecutive write / erase operations with a +/- 7 V swing.

sted, utgiver, år, opplag, sider
Electrochemical Society , 2009. Vol. 25, nr 6, s. 465-471
HSV kategori
Identifikatorer
URN: urn:nbn:se:liu:diva-118565DOI: 10.1149/1.3206646ISI: 000338086300045ISBN: 978-1-60768-093-2 (tryckt)ISBN: 978-1-56677-743-8 (tryckt)OAI: oai:DiVA.org:liu-118565DiVA, id: diva2:815497
Konferanse
7th International Symposium on High Dielectric Constant Materials and Gate Stacks held during the 216th Meeting of The Electrochemical-Society
Tilgjengelig fra: 2015-06-01 Laget: 2015-06-01 Sist oppdatert: 2015-06-10

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Totalt: 43 treff
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