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The role of Ohmic heating in dc magnetron sputtering
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering. KTH Royal Institute Technology, Sweden; University of Paris Saclay, France.
KTH Royal Institute Technology, Sweden; University of Paris Saclay, France; University of Iceland, Iceland.
University of Paris Saclay, France.
University of Paris Saclay, France.
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2016 (English)In: Plasma sources science & technology (Print), ISSN 0963-0252, E-ISSN 1361-6595, Vol. 25, no 6, 065024Article in journal (Refereed) Published
Abstract [en]

Sustaining a plasma in a magnetron discharge requires energization of the plasma electrons. In this work, Ohmic heating of electrons outside the cathode sheath is demonstrated to be typically of the same order as sheath energization, and a simple physical explanation is given. We propose a generalized Thornton equation that includes both sheath energization and Ohmic heating of electrons. The secondary electron emission yield gamma(SE) is identified as the key parameter determining the relative importance of the two processes. For a conventional 5 cm diameter planar dc magnetron, Ohmic heating is found to be more important than sheath energization for secondary electron emission yields below around 0.1.

Place, publisher, year, edition, pages
IOP PUBLISHING LTD , 2016. Vol. 25, no 6, 065024
Keyword [en]
magnetron sputtering; Ohmic heating; energy balance
National Category
Fusion, Plasma and Space Physics
Identifiers
URN: urn:nbn:se:liu:diva-133384DOI: 10.1088/0963-0252/25/6/065024ISI: 000388704100001OAI: oai:DiVA.org:liu-133384DiVA: diva2:1060079
Note

Funding Agencies|Swedish Research Council (VR) [621-2014-4882]; Icelandic Research Fund [130029]; Swedish Government Agency for Innovation Systems (VINNOVA) [2014-04876]

Available from: 2016-12-27 Created: 2016-12-22 Last updated: 2017-03-16

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The full text will be freely available from 2017-11-15 11:01
Available from 2017-11-15 11:01

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CiteExportLink to record
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Citation style
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