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Thermal and chemical stabilities of group-III sesquioxides in a flow of either N-2 or H-2
Tokyo University of Agriculture and Technology, Japan.
Tokyo University of Agriculture and Technology, Japan.
Tamura Corp, Japan.
Tokyo University of Agriculture and Technology, Japan.
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2016 (English)In: Japanese Journal of Applied Physics, ISSN 0021-4922, E-ISSN 1347-4065, Vol. 55, no 12, article id 1202BEArticle in journal (Refereed) Published
Abstract [en]

The thermal and chemical stabilities of group-III sesquioxides (Al2O3, Ga2O3, and In2O3) were comparatively investigated at an atmospheric pressure at heat treatment temperatures ranging from 250 to 1450 degrees C in a flow of either N-2 or H-2. In a flow of N-2, the thermal decomposition of alpha-Al2O3 was not observed at the temperatures investigated, while the decompositions of beta-Ga2O3 and c-In2O3 occurred above 1150 and 1000 degrees C, respectively, with no generation of group-III metal droplets on the surfaces. In contrast, the chemical reactions of alpha-Al2O3, beta-Ga2O3, and c-In2O3 began at low temperatures of 1150, 550, and 300 degrees C in a flow of H-2. Thus, the presence of H-2 in the gas flow significantly promotes the decomposition of group-III sesquioxides. The order of thermal and chemical stabilities (alpha-Al2O3 amp;gt;amp;gt; beta-Ga2O3 amp;gt; c-In2O3) obtained experimentally was verified by thermodynamic analysis, which also clarified dominant decomposition reactions of group-III sesquioxides. (C) 2016 The Japan Society of Applied Physics

Place, publisher, year, edition, pages
IOP PUBLISHING LTD , 2016. Vol. 55, no 12, article id 1202BE
National Category
Other Materials Engineering
Identifiers
URN: urn:nbn:se:liu:diva-133380DOI: 10.7567/JJAP.55.1202BEISI: 000388625100002OAI: oai:DiVA.org:liu-133380DiVA, id: diva2:1060086
Note

Funding Agencies|Japan Society for the Promotion of Science [16H06417, 16K04944]

Available from: 2016-12-27 Created: 2016-12-22 Last updated: 2017-11-29

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