Structural, morphological, and optical properties of Bi2O3 thin films grown by reactive sputteringShow others and affiliations
2017 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 624, p. 41-48Article in journal (Refereed) Published
Abstract [en]
Bi2O3 thin films were grown using reactive RF sputtering from a metallic Bi target. The influence of various deposition parameters (substrate temperature, applied power on target and oxygen content in the working gas) on the morphology, structure and optical properties of films was investigated. Depending on the O-2/(Ar + O-2) ratio of the working gas, bismuth, delta-Bi2O3, alpha-Bi2O3 or a mixture of these phases can be deposited, with a narrow window for growth of [111]-oriented delta-Bi2O3 thin films. The delta-Bi2O3 phase is stable from room temperature up to 350 degrees C (in air), where an irreversible transition to alpha-Bi2O3 occurs. This phase transformation is also shown to occur during TEM sample preparation, because of the inherent heating from the ion-milling process, unless liquid -nitrogen cooling is used. (C) 2017 Published by Elsevier B.V.
Place, publisher, year, edition, pages
Elsevier, 2017. Vol. 624, p. 41-48
Keywords [en]
Bismuth oxide; Reactive sputtering; Phase transition
National Category
Materials Chemistry
Identifiers
URN: urn:nbn:se:liu:diva-136305DOI: 10.1016/j.tsf.2017.01.013ISI: 000395215100007Scopus ID: 2-s2.0-85010211141OAI: oai:DiVA.org:liu-136305DiVA, id: diva2:1087975
Note
Funding Agencies|Swedish Foundation for Strategic Research (Future Research Leaders 5); Nordforsk [9046]; Nordic Innovation Centre [09046]; European Research Council (ERC) under the European Communitys Seventh Framework Programme (FP)/ERC [335383]; Swedish Research Council (VR) [2012-4430]
2017-04-102017-04-102017-04-27Bibliographically approved