α-alumina coatings on WC/Co substrates by physical vapor deposition
2009 (English)In: International journal of refractory metals & hard materials, ISSN 0958-0611, Vol. 27, no 2, 507-512 p.Article in journal (Refereed) Published
Physical vapor deposition coatings for cutting tools may be deposited by, e.g. reactive magnetron sputtering. Alumina growth in Ar/O2 gas mixtures gives rise to problems due to insulating layers on targets, and hysteresis effects with respect to oxygen gas flow. In this paper is described a technology for the deposition of crystalline alumina: reactive high power impulse magnetron sputtering. Pure Al was used as target material, and the cemented carbide (WC/Co) substrates were kept at 500-650 ºC. Hysteresis effects with respect to oxygen gas flow were alleviated, which enabled stable growth at a high deposition rate. The high power impulses were helpful in obtaining a crystalline oxide coating. X-ray diffraction and crosssection transmission electron microscopy showed that α-alumina films were formed. Technological testing of these PVD alumina coatings, with state-of-the-art AlTiN as benchmark, showed significantly improved crater wear resistance in steel turning.
Place, publisher, year, edition, pages
2009. Vol. 27, no 2, 507-512 p.
HiPIMS, HPPMS, ionized-PVD, alumina, corundum
IdentifiersURN: urn:nbn:se:liu:diva-15359DOI: 10.1016/j.ijrmhm.2008.10.007OAI: oai:DiVA.org:liu-15359DiVA: diva2:114049
On the day of defence date the status of article VII was: Accepted.
T.I. Selinder, E. Coronel, Erik Wallin and Ulf Helmersson, α-alumina coatings on WC/Co substrates by physical vapor deposition, 2009, International journal of refractory metals & hard materials, (27), 2, 507-512.
Copyright: Elsevier Science B.V., Amsterdam.