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Controlling the boron-to-titanium ratio in magnetron-sputter-deposited TiBx thin films
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering. University of Illinois, IL 61801 USA.
University of Illinois, IL 61801 USA; University of Illinois, IL 61801 USA.
University of Illinois, IL 61801 USA.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
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2017 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 35, no 5, article id 050601Article in journal (Refereed) Published
Abstract [en]

Magnetron sputter-deposited TiBx films grown from TiB2 targets are typically highly overstoichiometric with x ranging from 3.5 to 2.4 due to differences in Ti and B preferential ejection angles and gasphase scattering during transport between the target and the substrate. The authors show that the use of highly magnetically unbalanced magnetron sputtering leads to selective ionization of sputter-ejected Ti atoms which are steered via an external magnetic field to the film, thus establishing control of the B/Ti ratio with the ability to obtain stoichiometric TiB2 films over a wide range in Ar sputtering pressures. (C) 2017 American Vacuum Society.

Place, publisher, year, edition, pages
A V S AMER INST PHYSICS , 2017. Vol. 35, no 5, article id 050601
National Category
Condensed Matter Physics
Identifiers
URN: urn:nbn:se:liu:diva-141726DOI: 10.1116/1.4982649ISI: 000410595700001OAI: oai:DiVA.org:liu-141726DiVA: diva2:1147307
Note

Funding Agencies|Swedish Research Council [642-2013-8020, 2015.0043]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [SFO-Mat-LiU 2009-00971]; Wallenberg Scholar Grant [2016.0358]; U.S. Air Force Office of Scientific Research grant

Available from: 2017-10-05 Created: 2017-10-05 Last updated: 2017-10-05

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Petrov, IvanNedfors, NilsZhirkov, IgorRosén, JohannaGreczynski, GrzegorzBirch, JensHultman, LarsGreene, Joseph E
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Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Condensed Matter Physics

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