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Experimental and computational studies on toughness enhancement in Ti-Al-Ta-N quaternaries
Comenius University, Slovakia; Slovak Academic Science, Slovakia.
Comenius University, Slovakia.
Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics. Linköping University, Faculty of Science & Engineering. Ruhr University of Bochum, Germany.ORCID iD: 0000-0002-1379-6656
Comenius University, Slovakia.
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2017 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 35, no 6, article id 060602Article in journal (Refereed) Published
Abstract [en]

Design of hard ceramic material coatings with enhanced toughness, which prevents crack formation/propagation leading to brittle failure during application, is a primary industrial requirement. In this work, experimental methods supported by ab initio density functional theory (DFT) calculations and electronic structure analyses are used to investigate the mechanical behavior of magnetron sputtered Ti-Al-Ta-N hard coatings. The as-deposited Ti1-x-yAlxTayN (y = 0-0.60) films exhibit a single phase cubic sodium chloride (B1) structure identified as TiAl(Ta)N solid solutions. While the hardness H of Ti0.46Al0.54N (32.5 +/- 2 GPa) is not significantly affected by alloying with TaN (H of the quaternary nitrides varies between 26 +/- 2 and 35 +/- 4 GPa), the elastic stiffness monotonically decreases from 442 to 354 GPa with increasing Ta contents, which indicates improved toughness in TiAlTaN. Consistent with the experimental findings, the DFT results show that Ta substitutions in TiAlN reduce the shear resistance due to the enhanced occupation of metal-metal bonding states while preserving strong metal-N bonds. The metal-N bonding character, however, is progressively modified from prevalently ionic (TiAlN) toward more covalent (TiAlTaN). (C) 2017 American Vacuum Society.

Place, publisher, year, edition, pages
A V S AMER INST PHYSICS , 2017. Vol. 35, no 6, article id 060602
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:liu:diva-143366DOI: 10.1116/1.4997431ISI: 000415685300002OAI: oai:DiVA.org:liu-143366DiVA, id: diva2:1162789
Note

Funding Agencies|Slovak Research and Development Agency [APVV-14-0173]; Operational Program Research and Development [ITMS 26210120010]; Olle Engkvist Foundation

Available from: 2017-12-05 Created: 2017-12-05 Last updated: 2019-06-28

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Sangiovanni, Davide
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Theoretical PhysicsFaculty of Science & Engineering
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Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Inorganic Chemistry

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