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Etching behaviors of tunneling magnetoresistive (TMR) materials by ion beam etching system
Chulalongkorn Univ, Thailand.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.ORCID iD: 0000-0001-9140-6724
Chulalongkorn Univ, Thailand.
2018 (English)In: MATERIALS TODAY-PROCEEDINGS, ELSEVIER SCIENCE BV , 2018, Vol. 5, no 7, p. 15186-15191Conference paper, Published paper (Refereed)
Abstract [en]

In data storage manufacturing, ion etching process is commonly chosen for the preparation of surface patterns, for example, under the read-write head of the hard disk drive (HDD) to form an air bearing surface (ABS). This read-write head consists of a multilayer thin film of different materials to form a tunneling magnetoresistive (TMR) device. In this work, we applied the Monte Carlo-based simulation package to calculate the etching yield of major materials in the HDD heads structure. The plasma characteristic in the industrial-size ion beam etching (IBE) system has been studied by the special plasma diagnostic probes. Effects of input parameters in IBE system such as incident beam angle, ion beam current and gas flow in the system were considered. Plasma characteristic can be obtained from plasma I-V curve characterization. The sputtering yields of materials were found maximum when an incident angle is about 70 degrees to the normal surface. The floating potential of plasma in the system with the ion/electron compensation from PBN is calculated. (C) 2018 Elsevier Ltd. All rights reserved.

Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 2018. Vol. 5, no 7, p. 15186-15191
Keywords [en]
Plasma characterization; Ion beam etching; Multilayer thin film process
National Category
Fusion, Plasma and Space Physics
Identifiers
URN: urn:nbn:se:liu:diva-149771DOI: 10.1016/j.matpr.2018.04.080ISI: 000435205000076OAI: oai:DiVA.org:liu-149771DiVA, id: diva2:1234320
Conference
3rd International Conference on Applied Physics and Material Applications (ICAPMA)
Note

Funding Agencies|Department of Physics, Faculty of Science, Chulalongkorn University; Science Achievement Scholarship of Thailand (SAST)

Available from: 2018-07-24 Created: 2018-07-24 Last updated: 2018-07-24

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CiteExportLink to record
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Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
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  • asciidoc
  • rtf