liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Effect of substrate temperature on the deposition of Al-doped ZnO thin films using high power impulse magnetron sputtering
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering. Univ Lorraine, France.
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering.ORCID iD: 0000-0002-1744-7322
Univ Lorraine, France.
2018 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 347, p. 245-251Article in journal (Refereed) Published
Abstract [en]

Al-doped ZnO thin films were deposited using reactive high power impulse magnetron sputtering at substrate temperatures between room temperature and 600 degrees C. Two sample series with different oxygen partial pressures were studied. The films with the lowest resistivity of 3 x 10(-4) SI cm were deposited at the highest substrate temperature of 600 degrees C. The improvement of the electrical properties could be related to an improvement of the mobility due to the improved crystallinity. This improved crystallinity also increased the stability of the films towards ambient moisture. On the other hand, the detrimental influence of negative oxygen bombardment could be avoided, as the HiPIMS process can take place in the metal or transition mode even at relatively high oxygen partial pressures.

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA , 2018. Vol. 347, p. 245-251
Keywords [en]
ZnO; Transparent conducting oxide; HiPIMS; Temperature Electrical properties; Thin films
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:liu:diva-149677DOI: 10.1016/j.surfcoat.2018.04.089ISI: 000436917300028OAI: oai:DiVA.org:liu-149677DiVA, id: diva2:1235315
Note

Funding Agencies|European Commission within the DocMASE project

Available from: 2018-07-25 Created: 2018-07-25 Last updated: 2018-07-25

Open Access in DiVA

No full text in DiVA

Other links

Publisher's full text

Search in DiVA

By author/editor
Mickan, MartinHelmersson, Ulf
By organisation
Plasma and Coating PhysicsFaculty of Science & Engineering
In the same journal
Surface & Coatings Technology
Inorganic Chemistry

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 79 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf