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Growth and mechanical properties of 111-oriented V0.5Mo0.5Nx/Al2O3(0001) thin films
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, Faculty of Science & Engineering.ORCID iD: 0000-0003-3277-1945
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, Faculty of Science & Engineering. Univ Illinois, IL 61801 USA.
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2018 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 36, no 5, article id 051512Article in journal (Refereed) Published
Abstract [en]

Pseudobinary V0.5Mo0.5Nx(111) alloys with the Bl-NaCl crystal structure are grown on Al2O3(0001) substrates in an ultra-high-vacuum system by reactive magnetron sputter deposition in mixed Ar/N-2 atmospheres at temperatures T-s between 100 and 900 degrees C. Nitrogen-to-metal, N/(V + Mo), fractions x vary monotonically from 0.9 +/- 0.1 with T-s = 100 degrees C to 0.4 +/- 0.1 at T-s = 900 degrees C. Nitrogen loss at higher growth temperatures leads to a corresponding decrease in the relaxed lattice parameter a(o) from 4.21 +/- 0.01 angstrom at T-s = 300 degrees C to 4.125 +/- 0.005 angstrom with T-s = 900 degrees C. Scanning electron micrographs of cube-corner nanoindents extending into the substrate show that the films are relatively ductile, exhibiting material pile-up (plastic flow) around the indent edges. Nanoindentation hardnesses H and elastic moduli E, obtained using a calibrated Berkovich tip, of V0.5Mo0.5Nx(111) layers increase with increasing T-s(decreasing x) from 15 +/- 1 and 198 +/- 5 GPa at 100 degrees C to 23 +/- 2 and 381 +/- 11 GPa at 900 degrees C. These values are lower than the corresponding results obtained for the 001-oriented V0.5Mo0.5Nx films In addition, film wear resistance increases with increasing T-s, while the coefficient of friction, under 1000 mu N loads, is 0.09 +/- 0.01 for all layers. Published by the AVS.

Place, publisher, year, edition, pages
A V S AMER INST PHYSICS , 2018. Vol. 36, no 5, article id 051512
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Inorganic Chemistry
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URN: urn:nbn:se:liu:diva-151481DOI: 10.1116/1.5045048ISI: 000444033200029OAI: oai:DiVA.org:liu-151481DiVA, id: diva2:1250665
Note

Funding Agencies|Knut and Alice Wallenberg Foundation [KAW 2011-0094]; Swedish Research Council [VR 2014-5790]; Swedish Government Strategic Research Area Grant in Materials Science (SFO Mat-LiU) on advanced functional materials

Available from: 2018-09-24 Created: 2018-09-24 Last updated: 2018-09-24

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Kindlund, HannaLu, JunBroitman, EstebanPetrov, IvanGreene, Joseph EBirch, JensHultman, Lars
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Thin Film PhysicsFaculty of Science & EngineeringDepartment of Physics, Chemistry and Biology
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Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Inorganic Chemistry

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