liu.seSearch for publications in DiVA
Change search
ReferencesLink to record
Permanent link

Direct link
A bulk plasma model for dc and HiPIMS magnetrons
Royal Institute of Technology, Stockholm.
Royal Institute of Technology, Stockholm.
Royal Institute of Technology, Stockholm.
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
Show others and affiliations
2008 (English)In: PLASMA SOURCES SCIENCE and TECHNOLOGY, ISSN 0963-0252 , Vol. 17, no 4, 045009- p.Article in journal (Refereed) Published
Abstract [en]

A plasma discharge model has been developed for the bulk plasma (also called the extended presheath) in sputtering magnetrons. It can be used both for high power impulse magnetron sputtering (HiPIMS) and conventional dc sputtering magnetrons. Demonstration calculations are made for the parameters of the HiPIMS sputtering magnetron at Link "oping University, and also benchmarked against results in the literature on dc magnetrons. New insight is obtained regarding the structure and time development of the currents, the electric fields and the potential profiles. The transverse resistivity eta(perpendicular to) has been identified as having fundamental importance both for the potential profiles and for the motion of ionized target material through the bulk plasma. New findings are that in the HiPIMS mode, as a consequence of a high value of eta(perpendicular to), (1) there can be an electric field reversal that in our case extends 0.01-0.04m from the target, (2) the electric field in the bulk plasma is typically an order of magnitude weaker than in dc magnetrons, (3) in the region of electric field reversal the azimuthal current is diamagnetic in nature, i.e. mainly driven by the electron pressure gradient, and actually somewhat reduced by the electron Hall current which here has a reversed direction and (4) the azimuthal current above the racetrack can, through resistive friction, significantly influence the motion of the ionized fraction of the sputtered material and deflect it sideways, away from the target and towards the walls of the magnetron.

Place, publisher, year, edition, pages
2008. Vol. 17, no 4, 045009- p.
National Category
Natural Sciences
URN: urn:nbn:se:liu:diva-16092DOI: 10.1088/0963-0252/17/4/045009OAI: diva2:133142
Original Publication: N Brenning, I Axnas, M A Raadu, Daniel Lundin and Ulf Helmersson, A bulk plasma model for dc and HiPIMS magnetrons, 2008, PLASMA SOURCES SCIENCE and TECHNOLOGY, (17), 4, 045009. Copyright: Iop Publishing Available from: 2009-02-26 Created: 2009-01-07 Last updated: 2013-10-30Bibliographically approved

Open Access in DiVA

fulltext(465 kB)420 downloads
File information
File name FULLTEXT01.pdfFile size 465 kBChecksum SHA-512
Type fulltextMimetype application/pdf

Other links

Publisher's full text

Search in DiVA

By author/editor
Lundin, DanielHelmersson , Ulf
By organisation
Department of Physics, Chemistry and BiologyThe Institute of TechnologyPlasma and Coating Physics
Natural Sciences

Search outside of DiVA

GoogleGoogle Scholar
Total: 420 downloads
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Altmetric score

Total: 129 hits
ReferencesLink to record
Permanent link

Direct link