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The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
Linköping University, Department of Physics, Chemistry and Biology, Chemistry. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Chemistry. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Chemistry. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Chemistry. Linköping University, Faculty of Science & Engineering.
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2019 (English)In: The Journal of Physical Chemistry C, ISSN 1932-7447, E-ISSN 1932-7455, Vol. 123, no 42, p. 25691-25700Article in journal (Refereed) Published
Abstract [en]

Indium nitride (InN) is an interesting material for future high-frequency electronics due to its high electron mobility. The problematic deposition of InN films currently prevents full exploration of InN-based electronics. We present studies of atomic layer deposition (ALD) of InN using In precursors with bidentate ligands forming In-N bonds: tris(N,N-dimethyl-N,N -diisopropylguanidinato)indium(III), tris(N,N-diisopropylamidinato)indium(III), and tris(N,N-diisopropylformamidinato)indium(III). These compounds form a series were the size of the substituent on the endocyclic position decreases from -NMe2 to -Me and to -H, respectively. We show that when the size of the substituent decreases, the InN films deposited have a better crystalline quality, of better optical quality, lower roughness, and an In/N ratio closer to unity. From quantum chemical calculations, we show that the smaller substituents lead to less steric repulsion and weaker bonds between the ligand and In center. We propose that these effects render a more favored surface chemistry for the nitridation step in the ALD cycle, which explains the improved film properties.

Place, publisher, year, edition, pages
AMER CHEMICAL SOC , 2019. Vol. 123, no 42, p. 25691-25700
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:liu:diva-161847DOI: 10.1021/acs.jpcc.9b07005ISI: 000492803300019OAI: oai:DiVA.org:liu-161847DiVA, id: diva2:1370884
Note

Funding Agencies|Swedish foundation for Strategic Research through the project "Time-resolved low temperature CVD for III-nitrides" [SSF-RMA 15-0018]; Knut and Alice Wallenberg foundation through the project "Bridging the THz gap" [KAW 2013.0049]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University (Faculty Grant SFO Mat LiU) [2009 00971]

Available from: 2019-11-18 Created: 2019-11-18 Last updated: 2019-11-18

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Rouf, PollaO´brien, NathanRönnby, KarlSamii, RouzbehIvanov, Ivan GueorguievOjamäe, LarsPedersen, Henrik
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