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Infrared studies of trenches etched in silicon
2007 (English)Independent thesis Advanced level (degree of Magister), 20 points / 30 hpStudentuppsats
Abstract [en]

Previous studies of protein adsorption on silicon have been restricted by the choice of a simple structure or large surface for protein to adsorb on. The aim of this project was to develop an optical model for more complex nanostructures in form of trenches etched in silicon and then examine if a protein would adsorb to the surface. The method used was infrared ellipsometry. The experimental values from measurements on the sample were used to develop an optical model that represent the nanostructure. A three-layered biaxial model proved to be accurate. One sample was then exposed to the protein albumin and then measured upon again. The results before and after protein adsorption were compared and a small optical signature was found were it could be expected for this specific protein. This shows that it is possible to detect adsorption in a complex nanostructure and to develop an accurate optical model for said structure.

Place, publisher, year, pages
Institutionen för fysik, kemi och biologi, 2007. 60 p.
Keyword [en]
Silicon trenches, Infrared ellipsometry, protein adsorption
National Category
Physical Sciences
Identifiers
urn:nbn:se:liu:diva-10386 (URN)LITH-IFM-EX--07/1857--SE (ISRN)oai:DiVA.org:liu-10386 (OAI)
Presentation
2007-11-23, Röntgen, Fysikhuset, Linköping, Sweden, 10:30
Uppsok
fysik/kemi/matematik
Supervisors
Examiners
Available from2008-01-04 Created:2008-01-04

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Karlsson, Lars
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The Department of Physics, Chemistry and Biology
Physical Sciences

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