Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
2007 (English)In: Thin Solid Films, ISSN 0040-6090, Vol. 515, no 7-8, 3434-3438 p.Article in journal (Refereed) Published
Ta thin films were grown on Si substrates at different inclination angles with respect to the sputter source using high power impulse magnetron sputtering (HIPIMS), an ionized physical vapor deposition technique. The ionization allowed for better control of the energy and directionality of the sputtered species, and consequently for improved properties of the deposited films. Depositions were made on Si substrates with the native oxide intact. The structure of the as deposited films was investigated using X-ray diffraction, while a four-point probe setup was used to measure the resistivity. A substrate bias process-window for growth of bcc-Ta was observed. However, the process-window position changed with changing inclination angles of the substrate. The formation of this low-resistivity bcc-phase could be understood in light of the high ion flux from the HIPIMS discharge.
Place, publisher, year, edition, pages
Elsevier , 2007. Vol. 515, no 7-8, 3434-3438 p.
HPPMS, Ionized PVD, IPVD, Pulsed sputtering
IdentifiersURN: urn:nbn:se:liu:diva-10442DOI: 10.1016/j.tsf.2006.10.013OAI: oai:DiVA.org:liu-10442DiVA: diva2:17181
Original publication: J. Alamia, P. Eklunda, J.M. Anderssona, M. Lattemanna, E. Wallina, J. Bohlmarka, P. Perssona, and U. Helmersson, Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering, 2007, Thin Solid Films, (515), 7-8, 3434-3438. http://dx.doi.org/10.1016/j.tsf.2006.10.013. Copyright: Elsevier B.V., http://www.elsevier.com/2007-12-142007-12-142015-03-09Bibliographically approved