The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
2006 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 515, no 4, 1522-1526 p.Article in journal (Refereed) Published
The energy distribution of sputtered and ionized metal atoms as well as ions from the sputtering gas is reported for a high power impulse magnetron sputtering (HIPIMS) discharge. High power pulses were applied to a conventional planar circular magnetron Ti target. The peak power on the target surface was 1-2 kW/cm2 with a duty factor of about 0.5 %. Time resolved, and time averaged ion energy distributions were recorded with an energy resolving quadrupole mass spectrometer. The ion energy distributions recorded for the HIPIMS discharge are broader with maximum detected energy of 100 eV and contain a larger fraction of highly energetic ions (about 50 % with Ei > 20 eV) as compared to a conventional direct current magnetron sputtering discharge. The composition of the ion flux was also determined, and reveals a high metal fraction. During the most intense moment of the discharge, the ionic flux consisted of approximately 50 % Ti1+, 24 % Ti2+, 23 % Ar1+, and 3 % Ar2+ ions.
Place, publisher, year, edition, pages
Institutionen för fysik, kemi och biologi , 2006. Vol. 515, no 4, 1522-1526 p.
Sputtering, HIPIMS, Mass spectometry, Plasma characterization
National CategoryPhysical Sciences
IdentifiersURN: urn:nbn:se:liu:diva-10448DOI: 10.1016/j.tsf.2006.04.051OAI: oai:DiVA.org:liu-10448DiVA: diva2:17184
Original publication: J. Bohlmark, M. Lattemann, J. T. Gudmundsson, A. P. Ehiasarian, Y. Aranda Gonzalvo, N. Brenning & U. Helmersson, The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharg, 2006, Thin Solid Films, (515), 4, 1522-1526. http://dx.doi.org/10.1016/j.tsf.2006.04.051. Copyright: Elsevier B.V., http://www.elsevier.com/2007-12-172007-12-172013-10-30