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The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
Department of Electrical and Computer Engineering, University of Iceland, Reykjavik, Iceland; and Science Institute, University of Iceland, Reykjavik, Iceland.
Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield, UK.
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2006 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 515, no 4, 1522-1526 p.Article in journal (Refereed) Published
Abstract [en]

The energy distribution of sputtered and ionized metal atoms as well as ions from the sputtering gas is reported for a high power impulse magnetron sputtering (HIPIMS) discharge. High power pulses were applied to a conventional planar circular magnetron Ti target. The peak power on the target surface was 1-2 kW/cm2 with a duty factor of about 0.5 %. Time resolved, and time averaged ion energy distributions were recorded with an energy resolving quadrupole mass spectrometer. The ion energy distributions recorded for the HIPIMS discharge are broader with maximum detected energy of 100 eV and contain a larger fraction of highly energetic ions (about 50 % with Ei > 20 eV) as compared to a conventional direct current magnetron sputtering discharge. The composition of the ion flux was also determined, and reveals a high metal fraction. During the most intense moment of the discharge, the ionic flux consisted of approximately 50 % Ti1+, 24 % Ti2+, 23 % Ar1+, and 3 % Ar2+ ions.

Place, publisher, year, edition, pages
Institutionen för fysik, kemi och biologi , 2006. Vol. 515, no 4, 1522-1526 p.
Keyword [en]
Sputtering, HIPIMS, Mass spectometry, Plasma characterization
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:liu:diva-10448DOI: 10.1016/j.tsf.2006.04.051OAI: oai:DiVA.org:liu-10448DiVA: diva2:17184
Note
Original publication: J. Bohlmark, M. Lattemann, J. T. Gudmundsson, A. P. Ehiasarian, Y. Aranda Gonzalvo, N. Brenning & U. Helmersson, The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharg, 2006, Thin Solid Films, (515), 4, 1522-1526. http://dx.doi.org/10.1016/j.tsf.2006.04.051. Copyright: Elsevier B.V., http://www.elsevier.com/Available from: 2007-12-17 Created: 2007-12-17 Last updated: 2017-12-14
In thesis
1. Fundamentals of High Power Impulse Magnetron Sputtering
Open this publication in new window or tab >>Fundamentals of High Power Impulse Magnetron Sputtering
2006 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. Thin films grown by ionized physical vapor deposition (I-PVD) have lately shown promising results regarding film structure and adhesion. High power impulse magnetron sputtering (HIPIMS) is a relatively newly developed technique, which relies on the creation of a dense plasma in front of the sputtering target to produce a large fraction of ions of the sputtered material. In HIPIMS, high power pulses with a length of ~100 μs are applied to a conventional planar magnetron. The highly energetic nature of the discharge, which involves power densities of several kW/cm2, creates a dense plasma in front of the target, which allows for a large fraction of the sputtered material to be ionized.

The work presented in this thesis involves plasma analysis using electrostatic probes, optical emission spectroscopy (OES), magnetic probes, energy resolved mass spectrometry, and other fundamental observation techniques. These techniques used together are powerful plasma analysis tools, and used together give a good overview of the plasma properties is achieved.

from the erosion zone of the magnetron. The peak plasma density during the active cycle of the discharge exceeds 1019 electrons/m3. The expanding plasma is reflected by the chamber wall back into the center part of the chamber, resulting in a second density peak several hundreds of μs after the pulse is turned off.

Optical emission spectroscopy (OES) measurements of the plasma indicate that the degree of ionization of sputtered Ti is very high, over 90 % in the peak of the pulse. Even at relatively low applied target power (~200 W/cm2 peak power) the recorded spectrum is totally dominated by radiation from ions. The recorded HIPIMS spectra were compared to a spectrum taken from a DC magnetron discharge, showing a completely different appearance.

Magnetic field measurements performed with a coil type probe show significant deformation in the magnetic field of the magnetrons during the pulse. Spatially resolved measurements show evidence of a dense azimuthally E×B drifting current. Circulating currents mainly flow within 2 away cm from the target surface in an early part of the pulse, to later diffuse axially into the chamber and decrease in intensity. We record peak current densities of the E×B drift to be of the order of 105 A/m2.

A mass spectrometry (MS) study of the plasma reveals that the HIPIMS discharge contains a larger fraction of highly energetic ions as compared to the continuous DC discharge. Especially ions of the target material are more energetic. Time resolved studies show broad distributions of ion energies in the early stage of the discharge, which quickly narrows down after pulse switch-off. Ti ions with energies up to 100 eV are detected. The time average plasma contains mainly low energy Ar ions, but during the active phase of the discharge, the plasma is highly metallic. Shortly after pulse switch-on, the peak value of the Ti1+/Ar1+ ratio is over 2. The HIPIMS discharge also contains a significant amount of doubly charged ions.

Place, publisher, year, edition, pages
Institutionen för fysik, kemi och biologi, 2006
Series
Linköping Studies in Science and Technology. Dissertations, ISSN 0345-7524 ; 1014
Keyword
Plasma, Pulsed plasma, High Power Pulsed Magnetron Sputtering, Plasma Characterization
National Category
Physical Sciences
Identifiers
urn:nbn:se:liu:diva-7359 (URN)91-85523-96-8 (ISBN)
Public defence
2006-04-13, Planck, Fysikhuset, Campus Valla, Linköpings universitet, Linköping, 09:15 (English)
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Supervisors
Available from: 2006-09-12 Created: 2006-09-12 Last updated: 2013-10-30

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Böhlmark, JohanLattemann, MartinaHelmersson, Ulf

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