Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures
2006 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 100, no 3, Art. No. 033305 AUG 1 2006- p.Article in journal (Refereed) Published
The ion flux obtained during reactive magnetron sputtering of an Al target in Ar/O2 gas mixtures was studied by energy-resolved mass spectrometry, as a function of the total and O2 partial pressures. The positive ions of film-forming species exhibited bimodal energy distributions, both for direct current and radio frequency discharges, with the higher energy ions most likely originating from sputtered neutrals. For the negative oxygen ions a high-energy peak was observed, corresponding to ions formed at the target surface and accelerated towards the substrate over the sheath potential. As the total pressure was increased the high-energy peaks diminished due to gas-phase scattering. Based on these results, the role of energetic bombardment for the phase constituent of alumina thin films are discussed.
Place, publisher, year, edition, pages
College Park, MD, United States: American Institute of Physics (AIP), 2006. Vol. 100, no 3, Art. No. 033305 AUG 1 2006- p.
aluminium, sputter deposition, diffusion, mass spectra, high-frequency discharges, plasma materials processing
IdentifiersURN: urn:nbn:se:liu:diva-10472DOI: 10.1063/1.2219163ISI: 000239764100014OAI: oai:DiVA.org:liu-10472DiVA: diva2:17222
Original publication: Jon M. Andersson, E. Wallin, E. P. Münger & U. Helmersson, Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures, 2006, Journal of Applied Physics, (100), 033305. http://dx.doi.org/10.1063/1.2219163. Copyright: American Institute of Physics, http://jap.aip.org/jap/top.jsp2007-12-192007-12-192014-06-18