Strain-symmetrized Si/SiGe multi-quantum well structures grown by molecular beam epitaxy for intersubband engineering
2006 (English)In: Journal of luminescence, ISSN 0022-2313, Vol. 121, no 2, 403-408 p.Article in journal (Refereed) Published
Three strain-symmetrized Si/SiGe multi-quantum well structures, designed for probing the carrier lifetime of intrawell intersubband transitions between heavy hole 1 (HH1) and light hole 1 (LH1) states with transition energies below the optical phonon energy, were grown by molecular beam epitaxy at low temperature on fully relaxed SiGe virtual substrates. The grown structures were characterized by using various experimental techniques, showing a high crystalline quality and very precise growth control. The lifetime of the LH1 excited state was determined directly with pump-probe spectroscopy. The measurements indicated an increase of the lifetime by a factor of 2 due to the increasingly unconfined LH1 state, which agreed very well with the design. It also showed a very long lifetime of several hundred picoseconds for the holes excited out of the well to transit back to the well through a diagonal process.
Place, publisher, year, edition, pages
2006. Vol. 121, no 2, 403-408 p.
Molecular beam epitaxy (MBE); Si/SiGe; Pump-probe spectroscopy; Intersubband transition; Lifetime
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-13274DOI: 10.1016/j.jlumin.2006.08.080OAI: oai:DiVA.org:liu-13274DiVA: diva2:18170