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Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering. Evatec AG, Switzerland.ORCID iD: 0000-0001-9116-6302
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering.
KTHRoyal Inst Technol, Sweden; Univ Iceland, Iceland.
Leibniz Inst Surface Engn IOM, Germany.
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2023 (English)In: Plasma sources science & technology, ISSN 0963-0252, E-ISSN 1361-6595, Vol. 32, no 12, article id 125006Article in journal (Refereed) Published
Abstract [en]

The influence of pulse length, working gas pressure, and peak discharge current density on the deposition rate and ionised flux fraction in high power impulse magnetron sputtering discharges of copper is investigated experimentally using a charge-selective (electrically biasable) magnetically shielded quartz crystal microbalance (or ionmeter). The large explored parameter space covers both common process conditions and extreme cases. The measured ionised flux fraction for copper is found to be in the range from approximate to 10% to 80%, and to increase with increasing peak discharge current density up to a maximum at approximate to 1.25Acm-2 , before abruptly falling off at even higher current density values. Low working gas pressure is shown to be beneficial in terms of both ionised flux fraction and deposition rate fraction. For example, decreasing the working gas pressure from 1.0 Pa to 0.5 Pa leads on average to an increase of the ionised flux fraction by approximate to 14 percentage points (pp) and of the deposition rate fraction by approximate to 4pp taking into account all the investigated pulse lengths.

Place, publisher, year, edition, pages
IOP Publishing Ltd , 2023. Vol. 32, no 12, article id 125006
Keywords [en]
HiPIMS; copper; process development
National Category
Fusion, Plasma and Space Physics
Identifiers
URN: urn:nbn:se:liu:diva-200018DOI: 10.1088/1361-6595/ad10efISI: 001126297300001OAI: oai:DiVA.org:liu-200018DiVA, id: diva2:1826514
Note

Funding Agencies|Swedish Research Council [VR 2018-04139]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoeping University [2009-00971]; Icelandic Research Fund (Grant No. 196141), and Evatec AG [196141]; Evatec AG

Available from: 2024-01-11 Created: 2024-01-11 Last updated: 2024-11-04

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