Structure and properties of phosphorus-carbide thin solid films
2013 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 548, no 2, 247-254 p.Article in journal (Refereed) Published
Phosphorus-carbide (CPx) thin films have been deposited by unbalanced reactive magnetron sputtering and investigated by TEM, XPS, SEM, ERDA, Raman scattering spectroscopy, nanoindentation testing, and four-point electrical probe techniques. As-deposited films with x=0.1 are electron amorphous with elements of FL structure and high mechanical resiliency with hardness of 34.4 GPa and elastic recovery of 72%. The electrical resistivity of the films are in the range 0.4-1.7 Ωcm for CP0.027, 1.4-22.9 Ωcm for CP0.1, and lower than the minimal value the four-point probe is able to detect for CPx with x≥0.2.
Place, publisher, year, edition, pages
2013. Vol. 548, no 2, 247-254 p.
Phosphorus carbide, thin films, magnetron sputtering
Other Engineering and Technologies not elsewhere specified
IdentifiersURN: urn:nbn:se:liu:diva-17058DOI: 10.1016/j.tsf.2013.10.010ISI: 000327530300039OAI: oai:DiVA.org:liu-17058DiVA: diva2:201489