Synthesis of phosphorus-carbide thin films by magnetron sputtering
2008 (English)In: physica status solidi (RRL) - Rapid Research Letters, ISSN 1862-6254, Vol. 2, no 4, 191-193 p.Article in journal (Refereed) Published
Phosphorus-carbide, CPx (0.025≤x≤0.1) thin films have beensynthesized by magnetron sputtering from pressed graphite-phosphorustargets. The films were characterized by X-ray photoelectron spectroscopy,transmission electron microscopy and diffraction, andnanoindentation. CP0.02 exhibits C-P bonding in an amorphous structure with elements of curved grapheneplanes, yielding a material with unique short range order. These features are consistent with what has been predicted by our results of theoreticallymodeled synthetic growth of CPx. The films are mechanicallyresilient with hardness up to 24 GPa and elastic recovery upto 72%.
Place, publisher, year, edition, pages
Wiley InterScience , 2008. Vol. 2, no 4, 191-193 p.
Phosphorus-carbide (CPx), thin films, magnetron sputtering, resilient material
Other Engineering and Technologies not elsewhere specified
IdentifiersURN: urn:nbn:se:liu:diva-17114OAI: oai:DiVA.org:liu-17114DiVA: diva2:202001