Ion-assisted Physical Vapor Deposition for enhanced film properties on non-flat surfaces
2005 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, Vol. 23, no 2, 278-280 p.Article in journal (Refereed) Published
We have synthesized Ta thin films on Si substrates placed along a wall of a 2-cm-deep and 1-cm-wide trench, using both a mostly neutral Ta flux by conventional dc magnetron sputtering (dcMS) and a mostly ionized Ta flux by high-power pulsed magnetron sputtering (HPPMS). Structure of the grown films was evaluated by scanning electron microscopy, transmission electron microscopy, and atomic force microscopy. The Ta thin film grown by HPPMS has a smooth surface and a dense crystalline structure with grains oriented perpendicular to the substrate surface, whereas the film grown by dcMS exhibits a rough surface, pores between the grains, and an inclined columnar structure. The improved homogeneity achieved by HPPMS is a direct consequence of the high ion fraction of sputtered species.
Place, publisher, year, edition, pages
2005. Vol. 23, no 2, 278-280 p.
tantalum, ion beam assisted deposition, sputter deposition, scanning electron microscopy, transmission electron microscopy, atomic force microscopy, surface structure, surface roughness, porosity, metallic thin films
IdentifiersURN: urn:nbn:se:liu:diva-13376DOI: 10.1116/1.1861049OAI: oai:DiVA.org:liu-13376DiVA: diva2:20534