liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
DC Magnetron Sputtering Deposition of Nanocomposite Alumina - Zirconia Thin Films
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Department of Solid State Electronics, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
Department of Solid State Electronics, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
Department of Solid State Electronics, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
Show others and affiliations
2008 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 516, no 23, 8352-8358 p.Article in journal (Refereed) Published
Abstract [en]

Mixed aluminium oxide-zirconium oxide thin solid films have been synthesized at ~300 °C by reactive DC magnetron sputtering from two targets. Partial pressure control of the oxygen gas ensured stoichiometric films without compromising the deposition rate. The composition of the films ranged from pure alumina to pure zirconia as measured by XRay Photoelectron Spectroscopy. Microstructural characterisation showed that the pure zirconium oxide films nucleated initially as the tetragonal zirconia phase, while the 100/010/001 textured monoclinic zirconia phase grew under steady state conditions with a columnar structure. Addition of aluminium to ~3 at.% caused the formation of tetragonal zirconia in the films, while further additions led to an amorphous structure as governed by the alumina under the present kinetic limitations.

Place, publisher, year, edition, pages
2008. Vol. 516, no 23, 8352-8358 p.
Keyword [en]
Alumina, Zirconia, Dual Reactive DC Magnetron Sputtering, X-Ray Diffraction, Nanocomposite
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:liu:diva-17526DOI: 10.1016/j.tsf.2008.04.040OAI: oai:DiVA.org:liu-17526DiVA: diva2:209756
Available from: 2009-03-27 Created: 2009-03-27 Last updated: 2017-12-13Bibliographically approved
In thesis
1. Nanocrystalline Alumina-Zirconia Thin Films Grown by Magnetron Sputtering
Open this publication in new window or tab >>Nanocrystalline Alumina-Zirconia Thin Films Grown by Magnetron Sputtering
2008 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

Alumina-zirconia thin films have been deposited using dual magnetron sputtering. Film growth was performed at relatively low-to-medium temperatures, ranging from ~300°C to 810 °C. Different substrates were applied, including silicon (100), and industrially relevant materials, such as WC-Co hardmetal. Both radio-frequency sputtering and direct-current magnetron sputtering were utilised to achieve a range of film compositions. The influence of sputtering target was investigated; both ceramics and metals were used as sputtering sources. Microstructural characterisation was performed with a range of electron microscopy and x-ray diffraction techniques which show that the pure zirconia was deposited in the monoclinic phase. Reduced mobility of depositing species, as in the case of direct-current sputtering, yielded preferred crystallographic orientation in the {100} directions. The initial nucleation layer consisted of the metastable tetragonal zirconia phase. This phase could be grown over film thicknesses ~1 μm through the addition of ~3 at.% Al under similar low mobility conditions. For cases of higher mobility, as obtained through radio-frequency sputtering, the metastable cubic zirconia phase formed in the film bulk for alumina-zirconia nanocomposites. A combination of two mechanisms is suggested for the stabilisation of metastable zirconia phases: oxygen-deficiency and aluminium segregations with resultant restraint on the zirconia lattice. The sputter deposition process was investigated through energy resolved mass spectrometry in the case of radio-frequency sputtering; the sputter deposition flux contained a mixture of metallic ions, metaloxygen clusters, and oxygen ions. The presence of metal-oxygen clusters was found to be important in oxygen-stoichiometry and thus the phase selection of the resultant film. The energy distributions were similar when comparing sputtering from ceramic and metallic targets. A mass-balance model has also been developed for the transport phenomena and reactions of particles in reactive sputtering of two targets in a two-gas scenario for the alumina-zirconia system. Addition of nitrogen to the working gas was found to eliminate the hysteresis in the target poisoning for oxygen reactive sputtering. The higher reactivity of oxygen contributed to a higher oxygen content in resultant films compared to the oxygen content in the oxy-nitride working gas. The model was thus shown to be successful for tuning depositions in the alumina-zirconia oxy-nitride system.

Place, publisher, year, edition, pages
Linköping : Linköping University Electronic Presws, 2008. 68 p.
Series
Linköping Studies in Science and Technology. Dissertations, ISSN 0345-7524 ; 1153
National Category
Natural Sciences
Identifiers
urn:nbn:se:liu:diva-17529 (URN)978-91-85895-18-2 (ISBN)
Public defence
2008-02-22, Planck, Fysikhuset, Campus Valla, Linköpings universitet, Linköping, 10:15 (English)
Opponent
Supervisors
Available from: 2009-04-03 Created: 2009-03-27 Last updated: 2016-08-31Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full textLink to Ph.D. Thesis

Authority records BETA

Trinh, David HuyHultman, LarsHögberg, Hans

Search in DiVA

By author/editor
Trinh, David HuyHultman, LarsHögberg, Hans
By organisation
Thin Film PhysicsThe Institute of Technology
In the same journal
Thin Solid Films
Natural Sciences

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 169 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf