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Combinatorial surface-enhanced raman spectroscopy and spectroscopic ellipsometry of silver Island films
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.
University of Tokyo.
University of Tokyo.
2009 (English)In: Journal of Physical Chemistry C, ISSN 1932-7447, Vol. 113, no 12, 4820-4828 p.Article in journal (Refereed) Published
Abstract [en]

Utilizing a combinatorial method, we used spectroscopic ellipsometry to determine the dielectric functions of silver island films over a large range of sizes and morphologies from the percolation threshold down to average particle size smaller than 5 nm. We measured films on silicon substrates with 2 and 20 nm oxide layers and compared the surface-enhanced Raman scattering properties of the films. As expected, the films on 20-nm-thick oxide substrates showed increased Raman counts due to reduced damping of the plasmon resonance; however, the optical absorption was greater in the films on 2 nm oxide. The maximum Raman scattering was observed for average particle diameters of 13.6 and 25 nm and interparticle spacings of 3.3 and 4.1 nm for the 2 and 20 nm oxide substrates, respectively. The use of a combinatorial method resulted in significantly reduced uncertainties by avoiding multiple sample preparations and allowed unambiguous identification of optimal film parameters for the different substrates.

Place, publisher, year, edition, pages
2009. Vol. 113, no 12, 4820-4828 p.
National Category
Natural Sciences
URN: urn:nbn:se:liu:diva-18789DOI: 10.1021/jp8097654OAI: diva2:221792
Available from: 2009-06-05 Created: 2009-06-03 Last updated: 2009-06-05

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Oates, Thomas W.H.
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The Institute of TechnologyThin Film Physics
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