On the electron energy in the high power impulse magnetron sputtering discharge
2009 (English)In: JOURNAL OF APPLIED PHYSICS, ISSN 0021-8979, Vol. 105, no 12Article in journal (Refereed) Published
The temporal variation of the electron energy distribution function (EEDF) was measured with a Langmuir probe in a high power impulse magnetron sputtering (HiPIMS) discharge at 3 and 20 mTorr pressures. In the HiPIMS discharge a high power pulse is applied to a planar magnetron giving a high electron density and highly ionized sputtered vapor. The measured EEDF is Maxwellian-like during the pulse; it is broader for lower discharge pressure and it becomes narrower as the pulse progresses. This indicates that the plasma cools as the pulse progresses, probably due to high metal content of the discharge.
Place, publisher, year, edition, pages
2009. Vol. 105, no 12
IdentifiersURN: urn:nbn:se:liu:diva-20224DOI: 10.1063/1.3151953OAI: oai:DiVA.org:liu-20224DiVA: diva2:233821
Original Publication: J T Gudmundsson, P. Sigurjonsson, Petter Larsson, Daniel Lundin and Ulf Helmersson, On the electron energy in the high power impulse magnetron sputtering discharge, 2009, JOURNAL OF APPLIED PHYSICS, (105), 12, 123302. http://dx.doi.org/10.1063/1.3151953 Copyright: American Institute of Physics http://www.aip.org/2009-09-022009-08-312015-05-28