Microstructure and electrical properties of Ti-Si-C-Ag nanocomposite thin films
2007 (English)In: Surface and Coatings Technology, ISSN 0257-8972, Vol. 201, no 14, 6465-6469 p.Article in journal (Refereed) Published
Ti–Si–C–Ag nanocomposite coatings consisting of nanocrystalline TiC in an amorphous Si matrix with segregated Ag were deposited by dual magnetron sputtering from Ti3SiC2 and Ag targets. As evidenced by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, for Ag contents below 10 at.%, the Ag forms 10 nm large crystallites that are homogeneously distributed in the films. For higher Ag contents, coalescence during growth results in the formation of > 100 nm Ag islands on the film surface. The electrical resistivity of the coatings was measured in a four-point-probe setup, and ranged from 340 μΩcm (for Ti–Si–C coatings without Ag) to 40 μΩcm (for high Ag content).
Place, publisher, year, edition, pages
2007. Vol. 201, no 14, 6465-6469 p.
Sputtering, Titanium carbide, Silver; Resistivity, X-ray diffraction, Electron microscopy
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-14474DOI: 10.1016/j.surfcoat.2006.12.016OAI: oai:DiVA.org:liu-14474DiVA: diva2:23563