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Does hydrogen change the fullerenelike structure in CNx thin films?
National Physics Laboratory, Teddington.
Rutgers State University.
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.
University of Cambridge.
2009 (English)In: JOURNAL OF VACUUM SCIENCE and TECHNOLOGY A, ISSN 0734-2101, Vol. 27, no 5, 1227-1230 p.Article in journal (Refereed) Published
Abstract [en]

The authors have reported the structure of the nanoclusters in carbon nitride thin films before [D. Roy , Phys. Rev. B 70, 035406 (2004)]. In this work, effects of the addition of hydrogen in the deposition gas mixture on the structures of carbon nitride thin films prepared by magnetron sputtering were investigated using Raman spectroscopy. Raman measurements showed that the structures of carbon nanoclusters remained unaffected by the addition of hydrogen in the carbon nitride films. On the other hand, the structures of amorphous thin films were affected by the addition of hydrogen in the deposition gas mixture. These are explained in terms of changes in the ratios of the D-peak to the G-peak intensities and shifts in the G-peak centers.

Place, publisher, year, edition, pages
2009. Vol. 27, no 5, 1227-1230 p.
Keyword [en]
amorphous state, carbon compounds, hydrogen, nanostructured materials, Raman spectra, sputter deposition, thin films
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:liu:diva-20747DOI: 10.1116/1.3207949OAI: oai:DiVA.org:liu-20747DiVA: diva2:235968
Available from: 2009-09-18 Created: 2009-09-18 Last updated: 2009-09-18

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