Comment on "Pulsed laser deposition and properties of Mn+1AXx phase formulated Ti3SiC2 thin films"
2004 (English)In: Tribology letters, ISSN 1023-8883, E-ISSN 1573-2711, Vol. 17, no 4, 977-978 p.Article in journal (Other academic) Published
A recent paper by Hu et al. claimed synthesis of the MAX-phase Ti3SiC2at 100-300 °C using pulsed laser deposition. In this comment, we find that the evidence presented by Hu et al. is insufficient to show Ti3SiC2 formation. In fact, there is a simpler interpretation of their results from X-ray diffraction and transmission electron microscopy, namely that the material produced is a cubic TiC-based compound.
Place, publisher, year, edition, pages
2004. Vol. 17, no 4, 977-978 p.
IdentifiersURN: urn:nbn:se:liu:diva-24508DOI: 10.1007/s11249-004-8112-yLocal ID: 6637OAI: oai:DiVA.org:liu-24508DiVA: diva2:244829