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Magnetron sputter epitaxy of wurtzite Al1-xInxN (0.1 x 0.9) by Dual Reactive DC Magnetron Sputter Deposition
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.ORCID iD: 0000-0001-9140-6724
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.ORCID iD: 0000-0002-2837-3656
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
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2005 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 97, 83503-1-83503-9 p.Article in journal (Refereed) Published
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2005. Vol. 97, 83503-1-83503-9 p.
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URN: urn:nbn:se:liu:diva-28435Local ID: 13575OAI: oai:DiVA.org:liu-28435DiVA: diva2:249243
Available from: 2009-10-09 Created: 2009-10-09 Last updated: 2016-08-31

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Seppänen, TimoPersson, PerHultman, LarsBirch, Jens

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