liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Stress reduction in nanocomposite coatings consisting of hexagonal and cubic boron nitride
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics .
Forschungszentrum Karlsruhe.
Forschungszentrum Karlsruhe.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.ORCID iD: 0000-0001-9140-6724
Show others and affiliations
2006 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 200, no 22-23 SPEC. ISS., 6459-6464 p.Article in journal (Refereed) Published
Abstract [en]

Cubic boron nitride (c-BN) can be produced by PVD and CVD techniques by intensive ion bombardment leading to highly stressed films. To overcome the problem of highly stressed films, nanocomposite coatings consisting of hexagonal and cubic boron nitride (h-/c-BN) phases have been successfully deposited by reactive rf magnetron sputtering from an h-BN target at a substrate temperature of 350 °C and a dc substrate bias of - 700 V close to the resputtering limit. The morphology of the films was characterized using Fourier transform infrared spectroscopy (FTIR), X-ray diffraction/reflectivity (XRD/XRR) and high-resolution transmission electron microscopy (HRTEM). At low ion energy levels corresponding to low substrate bias values of up to ≈ 200 V pure h-BN was deposited. Higher ion energies led to a strong increase of the c-BN content as well as the residual stress in the films reaching their maximum at ≈ - 300 V substrate bias before decreasing again. Both the c-BN content and the residual stress showed qualitatively the same behaviour with a steeper drop of the residual stress between the maximum and the resputter limit. HRTEM investigation of the films with the maximum densification deposited at a substrate bias of ≈ - 300 V showed an h-BN interlayer growing on the Si substrate with the basal planes perpendicular to the substrate surface on which then almost pure c-BN was identified. The density of these coatings was 3.5 g/cm3 and the residual stress was determined to ≈ - 29 GPa. Depositing boron nitride at a substrate bias of - 700 V, these films comprised a hexagonal interlayer and c-BN in an h-BN matrix on top showing a lower density of 3.2 g/cm3 and a significantly reduced residual stress of - 9 GPa. A further reduction of the residual stress can be achieved by a following heat treatment at 900 °C for 2 h resulting in a value of ≈ - 3 GPa. © 2005 Elsevier B.V. All rights reserved.

Place, publisher, year, edition, pages
2006. Vol. 200, no 22-23 SPEC. ISS., 6459-6464 p.
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:liu:diva-29693DOI: 10.1016/j.surfcoat.2005.11.030Local ID: 15083OAI: oai:DiVA.org:liu-29693DiVA: diva2:250510
Available from: 2009-10-09 Created: 2009-10-09 Last updated: 2017-12-13

Open Access in DiVA

No full text

Other links

Publisher's full text

Authority records BETA

Persson, Per

Search in DiVA

By author/editor
Persson, Per
By organisation
The Institute of TechnologyPlasma and Coating Physics Thin Film Physics
In the same journal
Surface & Coatings Technology
Natural Sciences

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 106 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf