Microstructure-property relationships in arc-evaporated Cr-N coatings
2000 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 377-378, 407-412 p.Article in journal (Refereed) Published
Chromium nitride (Cr-N) coatings have received increased attention for tribological applications due to their favorable properties including wear resistance, toughness and oxidation resistance. These properties, in turn, can be strongly influenced by the coating microstructure and residual stress resulting from deposition and subsequent processing operations. In this study these microstructure-property correlations are investigated in Cr-N coatings grown by arc-evaporation. Prominent as-deposited features include formation of metastable amounts of the cubic d-CrN phase, and high levels of compressive residual stress and defect density. During annealing up to 650 ░C the residual stress and defect density decrease substantially, accompanied by a diffusion-based d-CrN to ▀-Cr2N phase transformation and equiaxed grain formation. The effects of these microstructural modifications on the hardness, fracture and wear properties of the coatings are evaluated using a combination of nanoindentation, scratch and pin-on-disk testing. Appreciable changes in these properties are found after annealing, and are correlated to the Cr-N microstructure. As-deposited coating hardness is enhanced by high levels of lattice defect density, with both decreasing concomitantly during annealing. Scratch results show that resistance to cohesive flaking is increased by annealing, suggesting ductility increases via defect annealing and equiaxed grain formation. Finally, the wear rate under dry sliding generally increased with annealing temperature, although wear rates of all Cr-N coatings significantly outperformed TiN tested under identical conditions.
Place, publisher, year, edition, pages
2000. Vol. 377-378, 407-412 p.
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-30167DOI: 10.1016/S0040-6090(00)01307-9Local ID: 15653OAI: oai:DiVA.org:liu-30167DiVA: diva2:250988