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Trends and challenges in VLSI technology scaling towards 100 nm.
Intel Corp., USA.
University of Waterloo, Canada.
Linköping University, The Institute of Technology. Linköping University, Department of Electrical Engineering, Electronic Devices.
University of Twente, Netherlands.
2002 (English)In: ASP-DAC/VLSI design 2002,2002, Washington/Brussels/Tokyo: IEEE Computer Society , 2002, 16- p.Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
Washington/Brussels/Tokyo: IEEE Computer Society , 2002. 16- p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-34855Local ID: 23710OAI: oai:DiVA.org:liu-34855DiVA: diva2:255703
Available from: 2009-10-10 Created: 2009-10-10

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Svensson, Christer

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CiteExportLink to record
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  • apa
  • harvard1
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