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A novel photoluminescence transition influenced by O implantation in ZnO bulk
Shanghai Institute of Technical Physics.
Shanghai Institute of Technical Physics.
Shanghai Institute of Technical Physics.
Shanghai Institute of Technical Physics.
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2006 (English)In: Chemical Physics Letters, ISSN 0009-2614, E-ISSN 1873-4448, Vol. 421, no 1-3, 309-311 p.Article in journal (Refereed) Published
Abstract [en]

The bulk zinc oxide (ZnO) sample implanted O with implantation concentration of 5 × 1019/cm3 was investigated by photoluminescence. A novel transition at emission energy of 3.08 eV at 77 K appears in the O-implanted sample. In order to find the origin of the novel transition, the O-implanted effects on the luminescence of ZnO bulk have been studied by first principle calculations based on the local density approximation. The theoretical results show that the novel transition at emission energy of 3.08 eV is attributed to O-antisite (Ozn) produced by O-implanted procedure.

Place, publisher, year, edition, pages
2006. Vol. 421, no 1-3, 309-311 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-36147DOI: 10.1016/j.cplett.2006.01.050Local ID: 30227OAI: oai:DiVA.org:liu-36147DiVA: diva2:256995
Available from: 2009-10-10 Created: 2009-10-10 Last updated: 2017-12-13

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Willander, Magnus

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