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Metamorphic InGaAs quantum wells for light emission at 1.3-1.6 μm
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2007 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 515, no 10, 4348-4351 p.Article in journal (Refereed) Published
Abstract [en]

Metamorphic InGaAs quantum well structures grown on GaAs reveal strong light emission at 1.3-1.6 μm, smooth surface with an average roughness below 2 nm and good rectifying I-V characteristics. Dark line defects are found in the QW. Post growth thermal annealing further improves the luminescence efficiency but does not remove those dark line defects. Some challenges of epitaxial growth using this method for laser applications are discussed. © 2006 Elsevier B.V. All rights reserved.

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2007. Vol. 515, no 10, 4348-4351 p.
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Natural Sciences Condensed Matter Physics
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URN: urn:nbn:se:liu:diva-39129DOI: 10.1016/j.tsf.2006.07.098Local ID: 46786OAI: oai:DiVA.org:liu-39129DiVA: diva2:259978
Available from: 2009-10-10 Created: 2009-10-10 Last updated: 2017-12-13

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Buyanova, IrinaChen, Weimin

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